Formation of Grown-in Defects during Czochralski Silicon Crystal Growth
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-11-15
著者
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Sano M
Sumitomo Metal Ind. Ltd. Saga Jpn
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Yanase Yoshio
Research And Development Center Sitix Division Sumitomo Metal Industries Ltd.
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NISHIKAWA Hideshi
R&D Center, Sumitomo Sitix Corporation
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TANAKA Tadami
R&D Center, Sumitomo Sitix Corporation
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YANASE Yoshio
R&D Center, Sumitomo Sitix Corporation
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HOURAI Masataka
R&D Center, Sumitomo Sitix Corporation
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SANO Masakazu
R&D Center, Sumitomo Sitix Corporation
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TSUYA Hideki
R&D Center, Sumitomo Sitix Corporation
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Hourai M
Research And Development Center Sitix Division Sumitomo Metal Industries Ltd.
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Tsuya H
Research And Development Center Sitix Division Sumitomo Metal Industries Ltd.
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Tanaka Tadami
R&d Center Sumitomo Sitix Corporation
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Nishikawa Hideshi
R&d Center Sumitomo Sitix Corporation
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- Influence of Crystal-Originated "Particle" Microstructure on Silicon Wafers on Gate Oxide Integrity
- Behavior of Defects in Heavily Boron Doped Czochralski Silicon
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- Dependence of Grown-in Defect Behavior on Oxygen Concentration in Czoehralski Silicon Crystals
- Formation of Grown-in Defects during Czochralski Silicon Crystal Growth
- Relationship between Grown-in Defects in Czochralski Silicon Crystals
- Improved Intrinsic Gettering Technique for High-Temperature-Treated CZ Silicon Wafers
- A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer : Semiconductors and Semiconductor Devices
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- TEM Observation of Defects Induced by Ni Contamination on a Si(100) Surface
- Comparison of Gettering Techniques by Means of Intentional Quantitative Cu Contamination : Electrical Properties of Condensed Matter
- Dependence of the Grown-in Defect Distribution on Growth Rates in Czochralski Silicon