Appearance of Resistance Minimum in Nanocrystalline Films Prepared by Gas Deposition Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-06-15
著者
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KITA Eiji
Institute of Applied Physics, University of Tsukuba
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Kita E
Univ. Tsukuba Tsukuba Jpn
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Kita Eiji
Center For Tsukuba Advanced Research Alliance University Of Tsukuba:institute Of Applied Physics Uni
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Tasaki Akira
Institute Of Applied Physics University Of Tsukuba:(present Address) Technical Laboratory Taiyo Yude
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Tasaki Akira
Institute Of Applied Physics University Of Tsukuba
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Kita E
Univ. Tsukuba Ibaraki Jpn
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IWAMOTO Yoji
Central Research Institute, Dai-Nippon Printing Co., Ltd.
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KASHUU Seiichirou
Vacuum Metallurgical Co., Ltd.
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SASAKI Yuji
Institute of Applied Physics, University of Tsukuba
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Kashuu Seiichirou
Vacuum Metallurgical Co. Ltd.
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Kita E
Institute Of Applied Physics And Center For Tsukuba Advanced Research Alliance (tara) University Of
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Kita Eiji
Institute For Applied Physics Tsukuba University
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Iwamoto Yoji
Central Research Institute Dai-nippon Printing Co. Ltd.
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Sasaki Yuji
Institute Of Applied Physics University Of Tsukuba
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