Amorphous-Se/GaAs : A Novel Heterostructure for Solid-State Devices
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
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Kikawa Takeshi
Central Research Laboratory, Hitachi Ltd.
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TAKATANI Shinichiro
Central Research Laboratory, Hitachi, Ltd.
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Takatani S
Hitachi Ltd. Tokyo Jpn
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NAKAZAWA Masatoshi
Central Research Laboratory, Hitachi Lid.
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Nakazawa Masatoshi
Central Resarch Laboratory Hitachi Ltd.
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Nakazawa Masatoshi
Central Research Laboratory Hitachi Lid.
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Kikawa T
Hitachi Ltd. Tokyo Jpn
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Kikawa Takeshi
Central Research Laboratory Hitachi Ltd.
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Takatani Shinichiro
Central Research Laboratory Hitachi Ltd.
関連論文
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- High-Performance HEMT with an Offset-Gate Structure for Millimeter-Wave Monolithic Microwave ICs
- Amorphous-Se/GaAs : A Novel Heterostructure for Solid-State Devices
- i-AlGaAs/n-GaAs doped-channel heterostructure insulated gate FET (DC-HIGFET) with n+-GaAs selectively grown by MOCVD
- Investigation of the Si Oxidation Process by XANES Spectroscopy Using Synchrotron Radiation
- Effect of Tl and Metallic Element Addition to In-Se Based Phase-change Optical Recording Film : MEDIA
- Studies of NH_3 Thermal Nitridation of Ultrathin Si-Oxide Films on Si using Photoemission Spectroscopy with Synchrotron Radiation
- Estimation of the Thickness of Ultrathin Silicon Nitride Films by X-Ray Photoelectron Spectroscopy
- Surface Analysis of LaB_6 Single Crystal Thermionic Emitters
- Reduction of Schottky Reverse Leakage Current Using GaAs Surface Cleaning with UVO_3 Treatment
- ArF-Excimer-Laser-Assisted Highly Selective Etching of InGaAs/InAlAs Using HBr and F_2 Gas Mixture
- Fabrication of InAlAs/InGaAs High-Electron-Mobility Transistors Using ArF-Excimer-Laser-Assisted Damage-Free Highly Selective InGaAs/InAlAs Etching
- Highly-Selective Dry Etching of InAlAs Over InGaAs Assisted by ArF Excimer Laser with Cl_2 Gas
- GaAs MESFET's with a Thermally Stable LaB_6 Self-Aligned Gate
- Passivation of InP-Based Heterostructure Bipolar Transistors in Relation to Surface Fermi Level
- Evidence of Ga_2Se_3-Related Compounds on Se-Stabilized GaAs Surfaces
- Effect of H_2 Annealing on a Pt/PbZr_xTi_0_3 Interface Studied by X-Ray Photoelectron Spectroscopy
- Defect Termination by Nitrogen Bonding due to NO Nitridation in MOS Structures