Investigation of the Si Oxidation Process by XANES Spectroscopy Using Synchrotron Radiation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-01-20
著者
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NAKAZAWA Masatoshi
Central Research Laboratory, Hitachi Lid.
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KAWASE Susumu
Central Research Laboratory, Hitachi, Ltd.
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Nakazawa Masatoshi
Central Resarch Laboratory Hitachi Ltd.
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Sekiyama H
Central Research Laboratory Hitachi Ltd.
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SEKIYAMA Hideo
Central Research Laboratory, Hitachi Ltd.
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Kawase Susumu
Central Research Laboratory Hitachi Ltd.:(present Address) Hitachi Research Institute
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Sekiyama Hideo
Department Of Chemistry Faculty Of Science The University Of Tokyo
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- Investigation of the Si Oxidation Process by XANES Spectroscopy Using Synchrotron Radiation
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