Highly-Selective Dry Etching of InAlAs Over InGaAs Assisted by ArF Excimer Laser with Cl_2 Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-02-28
著者
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TAKATANI Shinichiro
Central Research Laboratory, Hitachi, Ltd.
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TAKAZAWA Hiroyuki
Central Research Laboratory, Hitachi Ltd.
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Takazawa Hiroyuki
Central Research Laboratory Hitachi Ltd.
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Takatani Shinichiro
Central Research Laboratory Hitachi Ltd.
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