Measurement of Soft X-Ray Absorption by Al, Cr, and Ni Using Synchrotron Radiation

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Anisotropic Optical Spectra of α-Al_2O_3 Single Crystals in the Vacuum Ultraviolet Region. I. Spectra of Absorption Tail and Reflectivity
Anisotropic Optical Spectra of YAlO_3 (YAP) Single Crystals in the Vacuum Ultraviolet Region. III. Spectra of Optical Constants
Anisotropic Optical Spectra of YAlO_3 (YAP) Single Crystals in the Vacuum Ultraviolet Region. II. Spectra of Reflectivity
Optical Spectra of Y_3Al_5O_(YAG) Single Crystals in the Vacuum Ultraviolet Region. II
Anisotropic Optical Spectra of α-Al_2O_3 Single Crystals in the Vacuum Ultraviolet Region.II. Spectra of Optical Constants
Optical Spectra of Y_2O_3 Single Crystals in the Vacuum Ultraviolet Region. II
The Optical Spectra of α_Al_2O_3 Single Crystals in the Vacuum Ultraviolet Region
Optical Spectra of Y_2O_3 Single Crystals in VUV
Near-Normal Reflectance Spectra of CeO_2 and Ce_xLa_Al_2 System
XPS and UPS Studies of Valence Fluctuation and Surface States of Yb_4As_3,Yb_4Sb_3 and Yb_4Bi_3
Core Absorption Magnetic Circular Dichroism, Photoemission and Inverse Photoemission of MnAlGa and Mn_2Sb
Electronic States of Ce_xLa_Cu_6 Studied by Resonant Photoemission
Anisotropic Lattice Compression in Fe_2P
Comparison between 3p-XPS and 3d-XPS of LaAl_2,CeAl_2 and CeRu_2
Resonant Photoemission Spectra of the Valence and Ce 4d States of CeRu_2 : Effect of Coster-Kronig Decay on Energy Exchange between Two Continuum States
The 4d Photoabsorption Spectra of La,LaF_3,Ba and BaF_2 : Dependence on the Chemical and Structural Environment
Strong Circular Dichroism in Photoelectron Diffraction from Nonchiral, Nonmagnetic Material - Direct Observation of Rotational Motion of Electrons
Magnetic Circular Dichroism of Ni-Pd Alloys in Ni 2p, 3p, Pd 3p, and 4p Core Excitation Regions : Enhancement of Ni 3d Orbital Moment
Extreme Ultraviolet Absorption Spectra of Barium and Rare Earth Metals
A New Constant Deviation Monochromator for Angle Resolved Photoemission Spectroscopy
Surface Potential Images of Microstructured Organosilane Self-Assembled Monolayers Acquired by Kelvin Probe Force Microscopy : Atoms, Molecules, and Chemical Physics
Photoelectron Spectra of Pure Rh Metal and CuRh Alloys
Magnetic Circular Dichroism of Eu, Gd, Tb, Dy, and Ho in the 4d-4f Excitation Region
STM Study of the Effects of Etching on the Surface of Kish-Graphite : Surface, Interfaces and Films
Pressure Shifts of Valence and Core Exciton Peaks in Potassium Iodide
Surfaces and Interfaces of High-T_c Superconductors for Contact and Junction Formation Studied with Synchrotron Radiation Photoemisison Spectroscopy : High Temperature Superconducting Thin-Films(Solid State Devices and Materials 1)
Structure and Bonding at the CaF_2/GaAs(111) Interface : Surfaces, Interfaces and Films
Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process
Materials for Phase Zone Plate Fabrication for Use with Soft X-Rays : Techniques, Instrumentations and Measurement
Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography
Pressure Effects on the Curie Temperature of (Co_Mn_x)_2P
A Pressure cell for the Measurement of the Curie Temperature with the cubic-Anvil Press
Optimization of a High-Performance Chemically Amplified Positive Resist for Electron-Beam Lithography
Measurement of Soft X-Ray Absorption by Al, Cr, and Ni Using Synchrotron Radiation
Scanning Capacitance Microscopy as a Characterization Tool for Semiconductor Devices
Wave-Optical Property of Undulator Radiation and Its Effect on Grating Monochromators
Inhibition and Promotion Efficiency of bis-Phenol Type Dissolution Inhibitors during Development
High Performance Chemically Amplified Positive Electron-Beam Resist:Optimization of Base Additives for Environmental Stabilization
Photoemission Study of CeCu_6
Scanning Capacitance Microscopy as a Characterization Tool for Semiconductor Devices
SiO_2/Si System Studied by Scanning Capacitance Microscopy
Fabrication and Evaluation of X-Ray Multilayer Mirrors Prepared by Laser-Induced Chemical Vapor Deposition
Measurement of the Resistance of Manganin under Liquid Pressure to 100 kbar and Its Application to the Measurement of the Transition Pressures of Bi and Sn
Measurement of the Resistance of Manganin Wire with Cubic-Anvil Type Pressure Apparatus. II
Effect of Ar Pressure on the Sputter Deposition of Tungsten/Carbon Multilayers
Nickel/Vanadium and Nickel/Titanium Multilayers for X-Ray Optics
Simulations of STM Images and Work Function for Rough Surfaces

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