High Performance Chemically Amplified Positive Electron-Beam Resist:Optimization of Base Additives for Environmental Stabilization
スポンサーリンク
概要
著者
-
Sato S
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
-
Saito Shozo
Shizuoka Industrial Research Institute
-
Kihara N
Sony Corp. Tokyo Jpn
-
Naito T
Hitachi Ltd. Ibaraki Jpn
-
Nakasugi Tetsuro
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
関連論文
- Deflection of Light at the Boundaries between Ferroelectric and Antiferroelectric States in Chiral Smectic Liquid Crystals
- Charge Disproportionation in Highly One-Dimensional Molecular Conductor TPP[Co(Pc)(CN)_2]_2(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Giant Negative Magnetoresistance Reflecting Molecular Symmetry in Dicyano (phthalocyaninato) iron Compounds (Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties)
- Contribution of Degenerate Molecular Orbitals to Molecular Orbital Angular Momentum in Molecular Magnet Fe(Pc)(CN)_2(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
- Fabrication of Micro-Marks for Electron-Beam Lithography
- Anisotropic Thermal Diffusivity and Conductivity of YBCO(123) and YBCO(211) Mixed Crystals. II
- Anisotropic Thermal Diffusivity and Conductivity of YBCO(123) and YBCO(211) Mixed Crystals. I
- Simultaneous Measurement of Thermal Diffusivity and Conductivity Applied to Bi-2223 Ceramic Superconductors
- Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process
- Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation
- Contamination Charging up Effect in a Variably Shaped Electron Beam Writer
- Electron Beam Calibration Method for Character Projection Exposure System EX-8D
- Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match
- Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography
- Uptake of Enalapril by Rabbit Small Intestinal Brush-Border Membrane Vesicles
- pH-Dependent Inhibitory Effects of Angiotensin-Converting Enzyme Inhibitors on Cefroxadine Uptake by Rabbit Small Intestinal Brush-Border Membrane Vesicles and Their Relationship with Hydrophobicity and the Ratio of Zwitterionic Species
- Inhibitory Effects of Angiotensin-Converting Enzyme Inhibitors on Cefroxadine Uptake by Rabbit Small Intestinal Brush Border Membrane Vesicles
- Computer Simulation of Transition Processes between Bistable States in Bistable Nematic Liquid Crystal Cell Using Breaking Phenomenon of Surface Anchoring
- Influence of Azimuth Anchoring on Bistable Properties of Bistable Nematic Liquid Crystal Cells(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Optimization of a High-Performance Chemically Amplified Positive Resist for Electron-Beam Lithography
- Measurement of Soft X-Ray Absorption by Al, Cr, and Ni Using Synchrotron Radiation
- Determination of Pb/(Zr+Ti) and Zr/(Zr+Ti) Ratios of Lead Zirconate Titanate Surface by X-Ray Photoelectron Spectroscopy
- Microstructure of Pb(Zr, Ti)O_3-Based Pyroelectric Ceramics HIPped with Glass Encapsulation
- Inhibition and Promotion Efficiency of bis-Phenol Type Dissolution Inhibitors during Development
- High Performance Chemically Amplified Positive Electron-Beam Resist:Optimization of Base Additives for Environmental Stabilization
- A Cylindrical Multi-Layer Drift Chamber for a Low-Energy pp Experiment
- Influence of the Insertion of a Solid Plate on the Second Harmonic Component of a Focused Beam
- Measurement of the Nonlinearity Parameter in Dispersive Liquid using Focused Ultrasound