Effect of Ar Pressure on the Sputter Deposition of Tungsten/Carbon Multilayers

スポンサーリンク

概要

• 論文の詳細を見る

• Tungsten/carbon multilayers were formed using rf magnetron sputtering at various Ar gas pressures. With decreasing Ar gas pressure, the reflectivity of the multilayers increased and smooth interfaces were observed. The growth of amorphous like W films proved to be important in reducing the interfacial roughness.

• 社団法人応用物理学会の論文
• 1990-03-20

著者

• Seki Shoji

  Yoshida Nano Mechanism Project J. R. D. C. Nikon Co.

• NAGATA Hiroshi

  Yoshida Nano-Mechanism Project, JRDC

• Nagata Hiroshi

  Yoshida Nano Mechanism Project J. R. D. C. Nikon Co.:(present Address)nikon Co.

関連論文

• Measurement of Soft X-Ray Absorption by Al, Cr, and Ni Using Synchrotron Radiation
• Fabrication and Evaluation of X-Ray Multilayer Mirrors Prepared by Laser-Induced Chemical Vapor Deposition
• Effect of Ar Pressure on the Sputter Deposition of Tungsten/Carbon Multilayers
• Nickel/Vanadium and Nickel/Titanium Multilayers for X-Ray Optics

スポンサーリンク