Phase Defect Repair Method for Alternating Phase Shift Masks Conjugate Twin-Shifter Method
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概要
- 論文の詳細を見る
Phase shift masks (PSMs) enable current optical exposure systems to provide significantly higher resolution in effective depth of focus (DOF). Localized phase errors, or other transparent defects in the mask phase shifter elements, can cause loss of DOF and degradation of image contrast. Transparent defects of this type have prevented PSMs from becoming practical for large-scale production of integrated circuits containing deep submicrometer features. This paper describes a new technique that is useful for repairing Alternating PSMs containing transparent clefects in the phase shifter elements.
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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Taguchi Tsunemasa
Faculty Of Engineering Yamaguchi University
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Onodera T
Meiji Univ. Kawasaki Jpn
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Ohtsuka H
Ntt Mobile Communication Network Inc. Tokyo Jpn
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Ohtsuka H
Association Of Super-advanced Electronics Technologies:(present) Semiconductor Leading Edge Technolo
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Onodera Toshio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Ohtsuka Hiroshi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kuwahara Kazuyuki
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Taguchi Takashi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kuwahara Kazuyuki
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Taguchi Takashi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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