Diagonal Phase Errors Affecting Optical Intensity in Phase Defect Repair Elements

概要

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The phase shift method (PSM) improves practical resolution in optical lithography, but phase defects in masks significantly degrade image integrity. Mask repair reduces the effects of these defects by satisfying both phase step and diagonal phase conditions. Repair methods optimized for phase defects of π/2 and π are discussed. Analysis of diagonal phases in the vicinity of defects has been used to determine the approprinate conditions for restoring optical intensity. Repair elements are produced using a simple focused ion beam (FIB) milling process. The location and phase of each repair element are optimized to reduce the required number of repair elements. Effectiveness of the repair technique is verified using an i-line resist process.
社団法人応用物理学会の論文
1993-12-30