Ab Initio Molecular Orbital Study on the Reaction of Trimethylaluminum with an H Radical

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概要

• 論文の詳細を見る

• The reaction of trimethylaluminum (Al(CH_3)_3, TMA) with an H radical has been investigated using ab initio molecular orbital calculations. It has been shown that the reaction energy for Al(CH_3)_3 + H ⇾ AlH(CH_3)_2 + CH_3 and the activation energy for Al(CH_3)_3 + H ⇾ Al(CH_3)_2 + CH_4 are much smaller than the dissociation energy for radical decomposition, Al(CH_3)_3 ⇾ Al(CH_3)_2 + CH_3. This means that H radicals easily break Al-C bonds. Therefore, it is suggested that H radicals, which come from hydride group-V sources, play an important role in the reduction of unintentional carbon incorporation into layers grown from alkyl group-III materials.

• 社団法人応用物理学会の論文
• 1992-11-15

著者

• MASHITA Masao

  Faculty of Science and Technology,Hirosaki University

• Mashita M

  Research And Development Center Toshiba Corporation

• MASHITA Masao

  Research and Development Center, Toshiba Corp.

• HIRAOKA Yoshiko

  Research and Development Center, Toshiba Corporation

• Mashita Masao

  Research And Development Center Toshiba Corporation

• Hiraoka Yoshiko

  Research & Development Center Toshiba Corporation

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• Doping Enhancement by Excimer Laser Irradiation in Gas Source Molecular Beam Epitaxy of GaAs
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• KrF Excimer Laser Irradiation Effect on GaAs Atomic Layer Epitaxy
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• Role of Species Generated from Phosphorus Sources in InGaP Growth Mechanism
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