Processing Uniformity Improvement by Magnetic Field Distribution Control in Electron Cyclotron Resonance Plasma Chamber
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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MATSUO Seitaro
NTT LSI Laboratories
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Nishimura H
Kansai Univ. Osaka Jpn
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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NISHIMURA Hiroshi
NTT LSI Laboratories
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KIUCHI Mikiho
NTT LSI Laboratories
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