Thermal Expansion Coefficient of a Pyrolitically Deposited Silicon Nitride Film
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1967-10-05
著者
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SUGITA Yoshimitsu
Central Research Laboratory, Hitachi Ltd.
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TOKUYAMA Takashi
Central Research Laboratory
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FUJII Yasuhiro
Central Research Laboratory, Hitachi, Ltd.
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KISHINO Seigou
Central Research Laboratory, Hitachi, Ltd.
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Kishino Seigou
Central Research Laboratory Hitachi Ltd.
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Sugita Yoshimitsu
Central Research Laboratory Hitachi Ltd.
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Fujii Yasuhiro
Central Research Laboratory Hitachi Ltd.
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