Ag蒸着膜の初期成長過程における連続化膜厚と二次元化膜厚

概要

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Growth of vapor-deposited Ag films by the coalescence process in the post-nucleation stage is discussed.During and after deposition, the amplitude V of surface acoustic waves (SAW) propagated on the piezoelectric substrate through the films deposited on it, and the electric sheet resistivity of the films, R_<sq>, were measured.The microstructures of films with various thicknesses d were examined with a scanning electron microscope.As a result, it was found that (1) the thickness d_p at which V reaches a mininum value corresponds to the critical thickness at which the islands of a film begin to percolate, (2) the thickness d_c at which 1/R_<sq> begins to be proportional to the film thickness corresponds to the critical thickness at which the film becomes two-dimensionally continuous, (3) d_p and d_c become larger with decreasing deposition rate, and (4) in the early coalescence stage (d<d_p), the microstructural change progresses, increasing the average inter-island spacing.From these results, we can conclude that a higher deposition rate is necessary to suppress the microstructural change of islands and to allow fabrication of continuous ultra-thin films.
社団法人日本磁気学会の論文
1998-04-15