超高真空中加熱処理による金属薄膜の粒成長と平坦化(薄膜)

概要

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The effect of thermal annealing under ultra-high vacuum on the metallurgical microstructure of (111)-textured face-centered cubic (FCC) metal thin films was investigated. The surface morphology of 500-A-thick metal films drastically changes with increasing annealing temperature. Regardless of the kind of metal, the morphological changes can be classified into four stages, when the annealing temperature, T_<IR>, is normalized by the respective melting point of the metals, T_M. In stage I , 0.15 ≦ T_<IR>/T_M < 0.3, the surface roughness, R_a, of metal films decreases to 〜 3 A. In stage II, 0.3 ≦ T_<IR>/T_M ≦ 0.35, remarkable grain growth occurs, and the lateral grain diameter exceeds 1000 A. Small (〜 200 A) crystals appear on the large grains in the stage II', 0.35 < T_<IR>/T_M ≦ 0.45, and they grow large and coarsen the R_a in stage III, 0.45 < T_<IR>/T_M. We conclude that ultra-high vacuum annealing in stage II is effective in realizing large lateral grain size with small surface roughness in FCC metal films.
社団法人日本磁気学会の論文
2004-03-01