ハイブリッドプラズマCVDによるダイヤモンド状炭素膜の合成 : 入射イオンエネルギー効果

概要

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Diamond-like carbon films have been deposited by hybrid plasma decomposition of CH_4 diluted with H_2 gas. A hybrid plasma was generated by microwave and RF discharges, and an ion beam was produced by applying dc voltage between these two plasmas. The ion beam energy was controllable by adjusting the bias voltage. The property of the films strongly depended on the bias voltage corresponding to ion beam injection energy for deposition. The infrared bands had a main peak at 2955 cm^<-1> and a broad band around 2860 cm^<-1> corresponding to tetrahedral (sp^3) bonding structure. The deposition rate was decreased from 50Å/min to 25Å/min by increasing the bias voltage. The optical gap was measured with a UV-BIS absorption spectrometer for the films deposited on a quartz plate, and estimated to be 2.15-2.45 eV; its value declined with increased bias voltage during deposition. The microvickers hardness of the films was increased from 200 kg/mm^2 to 600 kg/mm^2 by increasing the bias voltage during deposition. Raman spectra showed two broad peaks at approximately 1300 cm^<-1> and 1600 cm^<-1> at a bias voltage of 100 V, identified with the peaks of microcrystalline glass-like carbon.
社団法人日本セラミックス協会の論文
1992-06-01