Chemical Vapor Growth and Manganese Metal Intercalation of TiS_2
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概要
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TiS. crystals with a IT-Cdlz type layered structure have been grown by achemical vapor reaction under different conditions of transport gas, size ofampoule, and temperature. Various attempts to intercalate Mn metals into theTiS. layers were made using electrochemical, dipping in pyridine solution, thermaldiffusion, and direct reaction methods. The EPR signals of the Mn-intercalatedTiS. show a Mn" state with the .(-value $ 2 and the hyperfine structure constant.4=80 x 10-' cm ', indicating a strong ionic nature of the crystalline environ-ment. A lattice expansion along the c-axis upon intercalation is discussed.
- 社団法人日本物理学会の論文
- 1984-03-15
著者
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NEGISHI Hiroshi
Department of Materials Science, Faculty of Science, Hiroshima University
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INOUE Masasi
Department of Materials Science,Faculty of Science,Hiroshima University
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Inoue Masasi
Department Of Applied Physics Fukui University
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Negishi Hiroshi
Department Of Materials Science Faculty Of Science Hiroshima University
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Inoue Masasi
Department Of Materials Science Faculty Of Science Hiroshima University
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