RFプラズマCVD法により生成された炭素系薄膜の諸特性

概要

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Properties of amorphous carbon films synthesized from methane by RF plasma CVD of capacitive coupling type are researched. The carbon films are produced under influence of sheath voltage up to 1100 V occurred on the surface of electrode connected with an RF generator. Electron diffraction, Raman spectrum, IR absorption spectrometry and XPS are employed to characterize the films. The films are transparent in the region of infrared and their refractive indexes are about 2.5 in the near infrared region. The films are amorphous state containing hydrogen. The values of optical gaps calculated from absorption spectrum of 185-2OOO nm are 0.5-1.8 eV. With increasing the sheath voltage, the hydrogen contents and the optical gaps decrease and the hardness of the films increase from 300 HV to 2500 HV. It is supposed that the hard film synthesized at high sheath voltage probably has a fundamentally random network structure consisting of olefin sp^2 bonding mainly, sp^2 bonding and aromatic sp^2 bonding in small amounts.
公益社団法人精密工学会の論文
1989-12-05