Practical Solutions to Enhance EWF Tunability of Ni FUSI Gates on HfO_2

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• Loh W.

  Institute Of Microelectronics

• LIM P.

  Institute for Medical Research

• LO G.

  Institute of Microelectronics

• KWONG D.-L.

  Institute of Microelectronics

• WANG X.

  SNDL, ECE Dept, National University of Singapore

• YANG J.

  SNDL, ECE Dept, National University of Singapore

• YU H.

  IMEC

• LI M.-F.

  SNDL, ECE Dept, National University of Singapore

• CHEN J.

  SNDL, ECE Dept, National University of Singapore

• XIE R.

  SNDL, ECE Dept, National University of Singapore

• ZHU C.

  SNDL, ECE Dept, National University of Singapore

• DU A.

  Institute of Microelectronics

• LIM Andy

  SNDL, ECE Dept, National University of Singapore

• MI Y.

  Institute of Material Research and Engineering

• LAI Doreen

  Institute of Material Research and Engineering

• BIESEMANS S.

  IMEC

• KWONG D-L

  Institute of Microelectronics

• Li M-f.

  Sndl Ece Dept National University Of Singapore

• Yang J.

  Sndl Ece Dept National University Of Singapore

• Lim Andy

  Sndl Ece Dept National University Of Singapore

• Wang X.

  Sndl Ece Dept National University Of Singapore

• Zhu C.

  Sndl Ece Dept National University Of Singapore

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