Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Loh W.
Institute Of Microelectronics
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LO G.
Institute of Microelectronics
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KWONG D.-L.
Institute of Microelectronics
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Hwang W.
Sndl Ece Dept National University Of Singapore
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CHIN Albert
Dept. of Electronics Eng., Nat'l Chiao Tung Univ., Nano Sci. Tech. Center, Univ. System of Taiwan
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Chin Albert
Dept. Of Electronics Eng. Nat'l Chiao Tung Univ. Nano Sci. Tech. Center Univ. System Of Taiwan
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Chin Albert
Dept. Of Electronics Eng. Nat'l Chiao-tung Univ.
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WANG X.
SNDL, ECE Dept, National University of Singapore
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YANG J.
SNDL, ECE Dept, National University of Singapore
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YU H.
IMEC
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LI M.-F.
SNDL, ECE Dept, National University of Singapore
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CHEN J.
SNDL, ECE Dept, National University of Singapore
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ZHU C.
SNDL, ECE Dept, National University of Singapore
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DU A.
Institute of Microelectronics
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BIESEMANS S.
IMEC
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HWANG W.
SNDL, ECE Dept, National University of Singapore
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KWONG D-L
Institute of Microelectronics
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Li M-f.
Sndl Ece Dept National University Of Singapore
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Yang J.
Sndl Ece Dept National University Of Singapore
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Wang X.
Sndl Ece Dept National University Of Singapore
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Zhu C.
Sndl Ece Dept National University Of Singapore
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