Terabits Patterning : Electron beam drawing with a bit pitch and track pitch of 25nm

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Extremely Small Proximity Effect in 30keV Electron Beam Drawing with Thin Calixarene Resist for 20 x 20nm^2 Pitch Dot Arrays
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Terabits Patterning : Electron beam drawing with a bit pitch and track pitch of 25nm
Terabits Patterning : Electron beam drawing with a bit pitch and track pitch of 25nm
Terabits Patterning : Electron beam drawing with a bit pitch and track pitch of 25nm(Patterned media & MRAM,The 8th Asian Symposium on Information Storage Technology (ASIST-8))
Orientation-controlled and long-range-ordered self-assembled nanodot array for ultrahigh-density bit-patterned media (Special issue: Microprocesses and nanotechnology)
Picogram Mass Sensor Using Resonance Frequency Shift of Cantilever
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Growth Kinetics of Silicon Carbide Chemical Vapor Deposition from Methyltrichlorosilane
Possibility of Forming 18-nm-Pitch Ultrahigh Density Fine Dot Arrays for 2 Tbit/in.2 Patterned Media Using 30-keV Electron Beam Lithography
Far-Field and Near-Field Optical Readings of under-50nm-Sized Pits : Optics and Quantum Electronics
Low-Reset-Current Ring-Confined-Chalcogenide Phase Change Memory
Fabrication of 5-nm-Sized Nanodots Using Self-Assembly of Polystyrene--Poly(dimethylsiloxane)
Electron Beam Lithography of 15\times 15 nm2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer
Possibility of Freely Achievable Multilevel Storage of Phase-Change Memory by Staircase-Shaped Pulse Programming
Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution
Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution

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