Fabrication of 5-nm-Sized Nanodots Using Self-Assembly of Polystyrene--Poly(dimethylsiloxane)

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In this work, we studied the self-assembly development of a polystyrene--poly(dimethylsiloxane) (PS--PDMS) block copolymer with molecular weight of 7,000--1,500, which has potential to form nanodots with size of several nanometers. Annealing time and temperature were intensively investigated. Distinct nanodots with a size of 6 nm and a pitch of 13 nm were obtained at a low annealing temperature of 130 °C, and nanodots with a size of 5 nm and a pitch of 12 nm were obtained at an annealing temperature of 170 °C. It was found that nanodots were formed when annealing time was reduced to as short as 6 h. This technique implies the possible high-throughput and low-cost fabrication of magnetic recording media with a density of up to 5.17 Tbit/in.2.
2012-06-25