Yin You | Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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概要
- Yin Youの詳細を見る
- 同名の論文著者
- Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japanの論文著者
関連著者
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HOSAKA Sumio
Graduate school of Engineering, Gunma University
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Yin You
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Zhang Hui
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Komori Takuya
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Akahane Takashi
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Huda Miftakhul
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Zhang Yulong
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Komori Takuya
Graduate School Ofengineering Tokai University
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Hosaka Sumio
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Mohamad Zulfakri
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Liu Jing
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Noguchi Tomoyuki
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
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Tamura Takuro
Graduate School of Engineering, Gunma University, Kiryu, Gunma 376-8515, Japan
著作論文
- Orientation-controlled and long-range-ordered self-assembled nanodot array for ultrahigh-density bit-patterned media (Special issue: Microprocesses and nanotechnology)
- Low-Reset-Current Ring-Confined-Chalcogenide Phase Change Memory
- Fabrication of 5-nm-Sized Nanodots Using Self-Assembly of Polystyrene--Poly(dimethylsiloxane)
- Electron Beam Lithography of 15\times 15 nm2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer
- Possibility of Freely Achievable Multilevel Storage of Phase-Change Memory by Staircase-Shaped Pulse Programming
- Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution
- Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution