Electron Beam Recording beyond 200Gbit/in^2 Density for Next Generation Optical Disk Mastering
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-05-15
著者
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Kobayashi Masaki
Laboratory of Clinical Pharmaceutics & Therapeutics, Division of Pharmasciences, Faculty of Pharmace
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Iida T
Pioneer Corp. Saitama Jpn
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Kuriyama Kazumi
Laboratory I Nano Process Technology Department Corporate Research And Development Laboratories Rese
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Kasono O
Corporate Research And Development Laboratories Pioneer Corporation
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KATSUMURA Masahiro
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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SATO Megumi
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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HASHIMOTO Kazunobu
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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HOSODA Yasuo
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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KASONO Osamu
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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KITAHARA Hiroaki
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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IIDA Tetsuya
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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