Improvement of Electron Beam Mastering Using Dry Etching Process
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-30
著者
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KASONO Osamu
Corporate Research and Development Laboratories, PIONEER Corporation
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KATSUMURA Masahiro
Corporate Research and Development Laboratories, PIONEER Corporation
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KOJIMA Yoshiaki
Corporate Research and Development Laboratories, PIONEER Corporation
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Sugimoto Tatsuya
Pdp Development Center Pioneer Corporation
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Kasono O
Corporate Research And Development Laboratories Pioneer Corporation
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SATO Megumi
Corporate Research and Development Laboratories, PIONEER Corporation
関連論文
- Study of Chemically Amplified Resist Using an Electron Beam Recorder
- Electron Beam Recording beyond 200Gbit/in^2 Density for Next Generation Optical Disk Mastering
- Improvement of Electron Beam Mastering Using Dry Etching Process
- High Density Mastering Using Electron Beam
- Recording Mechanism of High-Density Write-Once Disks Using Inorganic Recording Material
- Improvement of Electron Beam Mastering Using Dry Etching Process