Improvement of Electron Beam Mastering Using Dry Etching Process
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概要
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We have developed an electron beam recorder and utilized it in high-density disk mastering. We discussed an electron scattering in disk mastering that degrades the reproduction performance of disks. In order to improve the reproduction performance, we applied a dry etching process to the disk mastering process, and confirmed its efficacy in reducing the scattering effect and improving disk noise by calculation and experiments. We fabricated ‘Blu-ray Disc’-type read-only memory disks with and without the dry etching process, and noticed the advantage of the dry etching process from the jitter comparison. Finally, a 4.7% jitter was achieved in a 25 GB capacity disk, while a 5.7% jitter was obtained in a 27 GB capacity disk with additional recording compensation.
- 2004-07-15
著者
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Kojima Yoshiaki
Corporate Research And Development Laboratories Pioneer Corporation
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Sugimoto Tatsuya
Pdp Development Center Pioneer Corporation
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Katsumura Masahiro
Corporate Research And Development Laboratories Pioneer Corporation
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Kasono Osamu
Corporate Research And Development Laboratories Pioneer Corporation
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SATO Megumi
Corporate Research and Development Laboratories, PIONEER Corporation
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Sugimoto Tatsuya
PDP Development Center, PIONEER Corporation, 2680 Nishihanawa, Tatomi-cho, Nakakoma-gun, Yamanashi 409-3889, Japan
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Kasono Osamu
Corporate Research and Development Laboratories, PIONEER Corporation, 6-1-1 Fujimi, Tsurugashima-shi, Saitama 350-2288, Japan
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Kojima Yoshiaki
Corporate Research and Development Laboratories, PIONEER Corporation, 6-1-1 Fujimi, Tsurugashima-shi, Saitama 350-2288, Japan
関連論文
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