Nanopattern Profile Control Technology Using Reactive Ion Etching for 100 GB Optical Disc Mastering
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概要
- 論文の詳細を見る
We had developed an electron beam recorder (EBR) and studied a process technology for high-density optical disc mastering. In this study, we aimed at controlling a nanopattern profile by adopting inductively coupled plasma reactive ion etching (ICP-RIE) under simple conditions. To control a pattern inclination angle, we introduced an etching power ratio of antenna to bias and investigated the relationship. From the results of our investigation, we confirmed that inclination angle depended on etching power ratio linearly. Furthermore, in the case of a 100 GB read-only memory (ROM) equivalent pattern, we formed two kinds of inclined pattern by adopting ICP-RIE. We evaluated line edge roughness (LER) to determine the difference in pit profile accurately. As the result, we confirmed that LER was improved at a steep inclination angle. In addition, we applied ICP-RIE to a 300 GB ROM pattern.
- 2006-02-15
著者
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Hosoda Yasuo
Corporate Research And Development Laboratories Pioneer Corporation
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Iida Tetsuya
Corporate Research And Development Laboratories Pioneer Corporation
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Yokogawa Fumihiko
Corporate R&d Laboratories Pioneer Corporation
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Katsumura Masahiro
Corporate Research And Development Laboratories Pioneer Corporation
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Kasono Osamu
Corporate Research And Development Laboratories Pioneer Corporation
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Kuriyama Kazumi
Corporate Research And Development Laboratories Pioneer Corporation
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Kitahara Hiroaki
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Kitahara Hiroaki
Corporate Research and Development Laboratories, Pioneer Corporation, 1-1 Fujimi 6 chome, Tsurugashima-Shi, Saitama 350-2288, Japan
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Fujimura Megumi
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Kobayashi Masaki
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Hashimoto Kazunobu
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Hosoda Yasuo
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Kuriyama Kazumi
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Iida Tetsuya
Corporate Research & Development Center, Toshiba Corporation
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Katsumura Masahiro
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Kasono Osamu
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Yokogawa Fumihiko
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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Iida Tetsuya
Corporate Research and Development Laboratories, Pioneer Corporation, 6-1-1 Fujimi, Tsurugashima, Saitama 350-2288, Japan
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