High Density Mastering Using Electron Beam
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-04-01
著者
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Wada Yasumitsu
Corporate Research And Development Laboratories Pioneer Corporation
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KASONO Osamu
Corporate Research and Development Laboratories, PIONEER Corporation
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KATSUMURA Masahiro
Corporate Research and Development Laboratories, PIONEER Corporation
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KOJIMA Yoshiaki
Corporate Research and Development Laboratories, PIONEER Corporation
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Kasono O
Corporate Research And Development Laboratories Pioneer Corporation
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KITAHARA Hiroaki
Corporate Research and Development Laboratories, Pioneer Electronic Corp.
関連論文
- Study of Chemically Amplified Resist Using an Electron Beam Recorder
- Electron Beam Recording beyond 200Gbit/in^2 Density for Next Generation Optical Disk Mastering
- Improvement of Electron Beam Mastering Using Dry Etching Process
- High Density Mastering Using Electron Beam
- Improvement of Electron Beam Recorder for Mastering of Future Storage Media
- Electron Beam Recorder with Nanometer-Scale Accuracy for 100 Gbit/in2 Density Mastering
- High-Density Recording Using an Electron Beam Recorder
- High Density Mastering Using Electron Beam