High-Density Groove Mastering Using an Electron Beam Recorder and Plasma Etching Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-03-30
著者
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Katsumura Masahiro
Advanced Disk System Department, PIONEER Corporation
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Nishiwaki Hiroshi
Advanced Disk System Department, PIONEER Corporation
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Iida T
Pioneer Corp. Saitama Jpn
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Inoue Hiroyasu
0ptical Device Development Data Storage Technology Center Tdk Corporation Tdk Chikumagawa The Tc-i
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Itakura Tetsuro
Corporate Research & Developmentcenter Toshiba Corporation
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Nishiwaki Hiroshi
Advanced Disk System Department Pioneer Corporation
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Okano Makoto
Advanced Disk System Department Pioneer Corporation
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MITSUHATA Takanori
Advanced Disk System Department, PIONEER Corporation
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IIDA Tetsuya
Optical Disc Development Division AV
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KOUCHIYAMA Akira
IT Development Group Sony Corporation
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Kouchiyama A
It Development Group Sony Corporation
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Katsumura Masahiro
Advanced Disk System Department Pioneer Corporation
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Mitsuhata Takanori
Advanced Disk System Department Pioneer Corporation
関連論文
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- Fully Differential Direct-Conversion Receiver for W-CDMA Reducing DC-Offset Variation(Analog Circuit and Device Technologies)
- 1.9 GHz Si Direct Conversion Receiver IC for QPSK Modulation Systems (Special Issue on Microwave Devices for Mobile Communications)
- High-Density Groove Mastering Using an Electron Beam Recorder and Plasma Etching Process
- Electron Beam Recording beyond 200Gbit/in^2 Density for Next Generation Optical Disk Mastering
- A 2-V_ Linear Input-Range Fully Balanced CMOS Transconductor and Its Application to a 2.5-V 2.5-MHz Gm-C LPF
- Design of Fully Balanced Analog Systems Based on Ordinary and/or Modified Single-Ended Opamps (Special Section on Analog Circuit Techniques and Related Topics)