Electron Beam Recording beyond 200 Gbit/in2 Density for Next Generation Optical Disk Mastering
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概要
- 論文の詳細を見る
We had developed an electron beam recorder for high-density mastering. The electron beam recorder has a capability to record high-density patterning beyond 200 Gbit/in2 density because it has characteristic of fine beam convergence. The behavior of electron scattering is important to realizing high-density patterning. Scattered electrons degrade patterning resolution and high-density patterning can not be realized. Thus, we adopted a new substrate made of a material that reduces the influence of the electron backscattering and attempted to record high density patterning beyond 200 Gbit/in2 density. As experimental result, 300 Gbit/in2 density patterning could be realized.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-05-15
著者
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Kobayashi Masaki
Laboratory of Clinical Pharmaceutics & Therapeutics, Division of Pharmasciences, Faculty of Pharmace
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Kuriyama Kazumi
Laboratory I Nano Process Technology Department Corporate Research And Development Laboratories Rese
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KATSUMURA Masahiro
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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SATO Megumi
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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KASONO Osamu
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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IIDA Tetsuya
Laboratory I Nano Process Technology Department, Corporate Research and Development, Laboratories Re
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Kitahara Hiroaki
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Hashimoto Kazunobu
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Hosoda Yasuo
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Kuriyama Kazumi
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Iida Tetsuya
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Katsumura Masahiro
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Kasono Osamu
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Sato Megumi
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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Kobayashi Masaki
Laboratory I Nano Process Technology Department, Corporate Reseach and Development, Laboratories Research and Development Group, Pioneer Corporation, 1-1, Fujimi 6 chome, Tsurugashima-shi, Saitama 350-2288, Japan
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