Air Stable n-type Top Gate Carbon Nanotube Filed Effect Transistors with Silicon Nitride Insulator Deposited by Thermal Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-03-10
著者
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MATSUMOTO Kazuhiko
Osaka University
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KOJIMA Atsuhiko
CREST-JST
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MATSUMOTO Kazuhiko
CREST, Japan Science and Technology Agency
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MAEDA Masatoshi
CREST/JST
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KAMIMURA Takafumi
CREST, Japan Science and Technology Agency
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SHIMIZU Mitsuyasu
National Institute of Advanced Industrial Science and Technology
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CHAN Kyeong
CREST, Japan Science and Technology Agency
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- Non Contact Atomic Force Microscope Electrical Manipulation of Carbon Nanotubes and Its Application to Fabrication of a Room Temperature Operating Single Electron Transistor
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- Growth Control of Carbon Nanotube using Various Applied Electric Fields for Electronic Device Applications
- Air Stable n-type Top Gate Carbon Nanotube Filed Effect Transistors with Silicon Nitride Insulator Deposited by Thermal Chemical Vapor Deposition
- Room-Temperature Single-Hole Transistors Made Using Semiconductor Carbon Nanotube with Artificial Defects near Carrier Depletion Region
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- Non Contact Atomic Force Microscope Electrical Manipulation of Carbon Nanotubes and Its Application to Fabrication of a Room Temperature Operating Single Electron Transistor
- Air Stable n-type Top Gate Carbon Nanotube Filed Effect Transistors with Silicon Nitride Insulator Deposited by Thermal Chemical Vapor Deposition
- Room-Temperature Single-Hole Transistors Made Using Semiconductor Carbon Nanotube with Artificial Defects near Carrier Depletion Region
- Protein Sensor Using Carbon Nanotube Field Effect Transistor
- Silicon--Nitride-Passivated Bottom-Up Single-Electron Transistors
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