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Energy Research Unit, Indian Association for the Cultivation of Science | 論文
- Electronic and Structural Characterisation of Boron-Doped Hydrogenated Silicon Thin and Ultrathin Films Prepared by RF Magnetron Sputtering
- Comparison of Structural and Optoelectronic Properties of N-Type Microcrystalline Silicon and Silicon Oxide Films with Lowering of Thickness : Surfaces, Interfaces, and Films
- Influence of Chamber Pressure on Hydrogen Bonding Configurations in a-SiGe:H Films Prepared by Photo-CVD
- Influence of Chamber Pressure on Optoelectronic and Structural Properties of Boron-Doped Hydrogenated Silicon Films Prepared by RF Magnetron Sputtering
- Efficient Boron Incorporation in Hydrogenated Amorphous Silicon Films by a Novel Combination of RF Glow Discharge Technique and Heated Filament
- Growth and Characterization of Indium Tin Oxide Films Grown on Polymer Substrates by DC Magnetron Sputtering
- Control of Microstructure and Optoelectronic Properties of Si:H Films by Argon Dilution in Plasma-Enhanced Chemical Vapor Deposition from Silane
- Reduction of Thickness of N-Type Microcrystalline Hydrogenated Silicon Oxide Film Using Different Types of Seed Layer : Surfaces, Interfaces, and Films
- Development of High Quality P-Type Hydrogenated Amorphous Silicon Oxide Film and Its Use in Improving the Performance of Single Junction Amorphous Silicon Solar Cells
- The Growth of Crystallinity in Undoped SiO:H Films at Low RF-Power Density and Substrate Temperature : Semiconductors
- Photovoltaic Application of Nanomorph Silicon Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition
- Diamond-Like Carbon Films Prepared by Photochemical Vapour Deposition
- Role of Substrate Tenlperature on the Properties of Microcrystalline Silicon Thin Films : Semiconductors
- Highly Conducting Undoped μc-SiO:H Films Prepared by RF Glow Discharge
- Calculation of the Precursor Flux from Optical Emission Spectroscopy Data in Plasma Enhanced Chemical Vapour Deposition of Silane and its Correlation with the Deposition Rate(Nuclear Science, Plasmas, and Electric Discharges)
- Control of Crystallization at Low Thickness in μc-Si:H Films Using Layer-by-Layer Growth Scheme
- Development of High Quality 1.36 eV Amorphous SiGe:H Alloy by RF Glow Discharge under Helium Dilution
- Optoelectronic and Structural Properties of Good Quality Hydrogenated Amorphous Silicon Carbide Films Deposited by Hot Wire Assisted RF Plasma Deposition Technique
- Correlation of Electrical, Thermal and Structural Properties of Microcrystalline Silicon Thin Films : Semiconductors
- Lowering of Thickness of N-Type Microcrystalline Hydrogenated Silicon Film by Seeding Technique