Reduction of Thickness of N-Type Microcrystalline Hydrogenated Silicon Oxide Film Using Different Types of Seed Layer : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-07-01
著者
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BANERJEE Chandan
Energy Research Unit, Indian Association for the Cultivation of Science
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SARKER Arindam
Energy Research Unit, Indian Association for the Cultivation of Science
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BARUA Asok
Energy Research Unit, Indian Association for the Cultivation of Science
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Barua Asok
Energy Research Unit Indian Association For The Cultivation Of Science
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Sarker Arindam
Energy Research Unit Indian Association For The Cultivation Of Science
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BENERJEE Chandan
Energy Research Unit, Indian Association for the Cultivation of Science
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Benerjee Chandan
Energy Research Unit Indian Association For The Cultivation Of Science
関連論文
- Comparison of Structural and Optoelectronic Properties of N-Type Microcrystalline Silicon and Silicon Oxide Films with Lowering of Thickness : Surfaces, Interfaces, and Films
- Growth and Characterization of Indium Tin Oxide Films Grown on Polymer Substrates by DC Magnetron Sputtering
- Reduction of Thickness of N-Type Microcrystalline Hydrogenated Silicon Oxide Film Using Different Types of Seed Layer : Surfaces, Interfaces, and Films
- Development of High Quality P-Type Hydrogenated Amorphous Silicon Oxide Film and Its Use in Improving the Performance of Single Junction Amorphous Silicon Solar Cells
- The Growth of Crystallinity in Undoped SiO:H Films at Low RF-Power Density and Substrate Temperature : Semiconductors
- Diamond-Like Carbon Films Prepared by Photochemical Vapour Deposition
- Highly Conducting Undoped μc-SiO:H Films Prepared by RF Glow Discharge
- Control of Crystallization at Low Thickness in μc-Si:H Films Using Layer-by-Layer Growth Scheme
- Lowering of Thickness of N-Type Microcrystalline Hydrogenated Silicon Film by Seeding Technique
- Growth and Characterization of Indium Tin Oxide Films Grown on Polymer Substrates by DC Magnetron Sputtering