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Device Development Center Hitachi Ltd. | 論文
- Slurry Chemical Corrosion and Galvanic Corrosion during Copper Chemical Mechanical Polishing
- Molecular Adsorption on Ultrafine Precious Metal Particles Studied by Density Functional Calculation
- Influence of Cu-Ion Migration and Fine-Line Effect on Time-Dependent Dielectric Breakdown Lifetime of Cu Interconnects
- Impact of Self-Aligned Metal Capping Method on Submicron Copper Interconnections
- A 120-MHz BiCMOS Superscalar RISC Processor (Special Section on the 1993 VLSI Circuits Symposium (Joint Issue with the IEEE Journal of Solid-State Circuits, Vol.29, No.4 April 1994))
- Analysis of Boron Penetration and Gate Depletion Using Dual-Gate PMOSFETs for High Performance G-Bit DRAM Design(Special Issue on Microelectronic Test Structures)
- Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging
- Proposal for the Coma Aberration Dependent Overlay Error Compensation Technology
- Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
- High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
- Effects of 50 to 200-keV Electrons by BEASTLI Method on Semiconductor Devices (Special Issue on Scientific ULSI Manufacturing Technology)
- High-Resolution Proximity Exposure through a Phase Shifter Mask
- High-Resolution Wafer Inspection Using the "in-lens SEM" (Special Issue on Scientific ULSI Manufacturing Technology)
- Precise Linewidth Measurement Using a Scanning Electron Probe (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Bisazidobiphenyls/Novolak Resin Negative Resist Systems for i-Line Phase-Shifting Lithography
- Excitation-Power-Density Dependent ac Surface Photovoltages in Radiation-Damaged Si Wafer
- Effects of Overt and Covert Task Instructions and Stimulus Modality on Orienting Response Recorded by Electrodermal Indices
- 「電流立上り電圧」ばらつきに起因する微細MOSトランジスタのランダム電流ばらつきの解析
- BiCMOS Circuit Techniques for 3.3 V Microprocessors (Special Section on Low-Power and Low-Voltage Integrated Circuits)
- Design Philosophy of a High Performance BiCMOS Microprocessor