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Department Of Mechanical Engineering Tokushima University | 論文
- Defect Formation in (0001)- and (1120)-Oriented 4H-SiC Crystals P^+-Implanted at Room Temperature
- Ultrafast Coherent Control of Excitons and Exciton-Polaritons in Quantum Nanostructure
- Ultrafast Coherent Control of Excitons in Quantum Nano-Structures
- Film Degradation in AlN Preparation by Facing Target System ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAIN Thin Films by Synchrotron Radiation(Advanced Technology of Experimental Mechanics)
- OS4(P)-16(OS04W0240) Measurement of Residual Stress in Nano-Size Copper Thin Films by Synchrotron Radiation
- OS4(P)-13(OS04W0205) Evaluation of Residual Stress in TiN Thin Films Deposited by Arc-Ion-Plating with Synchrotron Radiation
- OS4(5)-22(OS04W0203) Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAlN Thin Films by Synchrotron Radiation
- Transmission Electron Microscopy of Sublimation-Grown GaN Single Crystal and GaN Homoepitaxial Film
- X-Ray Stress Measurement and Mechanical Properties of TiN Films Coated on Aluminum and Aluminum Alloy Substrates by Arc Ion Plating and Ion Beam Mixing
- Influence of Target Shape on Properties of AlN Sputtered Film
- OS4(P)-18(OS04W0258) Residual Stress Measurement of the Quenching Material by the Neutron Diffraction
- OS4(P)-12(OS04W0170) Residual Stress Measurement of Fiber Reinforced Metal Composite by Neutron and X-Ray Diffraction
- OS4(4)-18(OS04W0210) X-Ray and Neutron Diffraction Measurements of Residual Stresses in Cr, CrN and CrN on Cr Interlayer Films Deposited by Arc-Ion-Plating
- 2-2 Estimation of Human Tissue Aging by Autofluorescence Lifetime
- Cross-Sectional Shapes of Corner Zones of Hexagonal Steel Pipes Formed by Extroll-Forming Mill with Expanding Inner Idler Rolls
- Gas Pressure Dependence of AIN Film Properties in Alternating Sputtering System
- OS4(P)-15(OS04W0237) Residual Stress of Cu/TiN Films Deposited by Ion Plating and RF Sputtering
- OS4(P)-14(OS04W0209) Characteristic Evaluation of ZrO_2 Film Deposited by DC Magnetron Sputtering
- OS4(1)-2(OS04W0204) Effect of Powder Target on Crystal Orientation and Residual Stress in Sputtered GaN Film