Jung Yi-Jung | Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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概要
- Jung Yi-Jungの詳細を見る
- 同名の論文著者
- Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Koreaの論文著者
関連著者
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Lee Hi-deok
Department Of Electronics Engineering Chungnam National University
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Jung Yi-Jung
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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KWON Hyuk-Min
Department of Electronics Engineering, Chungnam National University
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Han In-shik
Department Of Electronics Engineering Chungnam National University
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Kwon Hyuk-Min
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Park Sang-Uk
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Lee Ga-won
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Bok Jung-Deuk
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Kang Chang-Yong
International SEMATECH, 2706 Montopolis Drive, Austin, TX 78741, U.S.A.
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Lee Byoung-Hun
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), Gwangju 500-712, Korea
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Jammy Raj
International SEMATECH, 2706 Montopolis Drive, Austin, TX 78741, U.S.A.
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Kwak Ho-Young
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Choi Woon-Il
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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KWAK Ho-Young
Department of Electronics Engineering, Chungnam National University
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Ha Man-Lyun
Dongbu HiTec Semiconductor Inc., Seoul 891-10, Korea
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Lee Ju-Il
Dongbu HiTec Semiconductor Inc., Seoul 891-10, Korea
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Lee Hi-Deok
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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CHUNG Yi-Sun
Magnachip Semiconductor Inc.
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JANG Jae-Hyung
Department of Electronics Engineering, Chungnam National University
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KWON Sung-Kyu
Department of Electronics Engineering, Chungnam National University
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Kwon Hyuk-min
Dept. Of Electronics Engineering Chungnam National University
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Bok Jung-deuk
Dept. Of Electronics Engineering Chungnam National University
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Jang Jae-Hyung
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Ko Sung-Yong
DMS Co., Ltd., Suwon, Gyeonggi 443-803, Korea
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Lee Won-Mook
DMS Co., Ltd., Suwon, Gyeonggi 443-803, Korea
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Shin Hong-Sik
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Jammy Raj
International SEMATECH, Austin, TX 78741, U.S.A.
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Kang Chang-Yong
International SEMATECH, Austin, TX 78741, U.S.A.
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Lee Ga-Won
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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Han In-Shik
Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea
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SHIN Jong-Kwan
Department of Electronics Engineering, Chungnam National University
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HWANG Seon-Man
Department of Electronics Engineering, Chungnam National University
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SUNG Seung-Yong
Department of Electronics Engineering, Chungnam National University
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LEE Da-Soon
Magnachip Semiconductor Inc.
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Choi Deuk-Sung
Divison of Electronics & Information Engineering, Yeungnam College of Science and Technology, Daegu 705-703, Korea
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Lim Min-Gyu
MagnaChip Semiconductor Ltd., Cheongju, Chungbuk 361-725, Korea
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Lee Jung-Hwan
MagnaChip Semiconductor Ltd., Cheongju, Chungbuk 361-725, Korea
著作論文
- Conduction Mechanism and Reliability Characteristics of a Metal--Insulator--Metal Capacitor with Single ZrO2 Layer
- Effect of nitrogen concentration on low-frequency noise and negative bias temperature instability of p-channel metal-oxide-semiconductor field-effect transistors with nitrided gate oxide (Special issue: Dielectric thin films for future electron devices: s
- Erratum: ``Comparison of Multilayer Dielectric Thin Films for Future Metal--Insulator--Metal Capacitors: Al2O3/HfO2/Al2O3 versus SiO2/HfO2/SiO2''
- Comparison of Multilayer Dielectric Thin Films for Future Metal--Insulator--Metal Capacitors: Al2O3/HfO2/Al2O3 versus SiO2/HfO2/SiO2
- Dependence of Hot Carrier Reliability and Low Frequency Noise on Channel Stress in Nanoscale n-Channel Metal--Oxide--Semiconductor Field-Effect Transistors
- Novel PNP BJT Structure to Improve Matching Characteristics for Analog and Mixed Signal Integrated Circuit Applications