Oda Hidekazu | Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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概要
- Oda Hidekazuの詳細を見る
- 同名の論文著者
- Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japanの論文著者
関連著者
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Oda Hidekazu
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Sugii Nobuyuki
Central Research Laboratory Hitachi Ltd.
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Tsuchiya Ryuta
Central Research Laboratory Hitachi Ltd.
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Ishigaki Takashi
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Morita Yusuke
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Iwamatsu Toshiaki
Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Inoue Yasuo
Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Iwamatsu Toshiaki
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Inoue Yasuo
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Hiramoto Toshiro
Institute Of Industrial Science The University Of Tokyo
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Oda Hidekazu
Renesas Technology Corporation Wafer Process Engineering Development Department
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Hayashi Kiyoshi
Renesas
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SHIGA Katsuya
Renesas Technology Corp.
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Shiga Katsuya
Renesas Technology Corporation Wafer Process Engineering Development Department
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Ohji Yuzuru
Process Technology Development Division Renesas Technology Corp.
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Hayashi Takashi
Renesas Technology Corperation, Wafer Process Engineering Development Department, 4-1 Mizuhara, Itam
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Yamashita Tomohiro
Renesas Technology Corperation, Wafer Process Engineering Development Department, 4-1 Mizuhara, Itam
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Eimori Takahisa
Renesas Technology Corperation, Wafer Process Engineering Development Department, 4-1 Mizuhara, Itam
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Inuishi Masahide
Renesas Technology Corperation, Wafer Process Engineering Development Department, 4-1 Mizuhara, Itam
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Ohji Yuzuru
Renesas Technology Corperation, Wafer Process Engineering Development Department, 4-1 Mizuhara, Itam
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Kimura Shinichiro
Central Research Laboratory Hitachi Ltd.
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Eimori Takahisa
Renesas Technology Corporation Wafer Process Engineering Development Department
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Ohji Yuzuru
Renesas Technology Corporation Wafer Process Engineering Development Department
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Inuishi Masahide
Renesas Technology Corporation Wafer Process Engineering Development Department
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Yoshimoto Hiroyuki
Central Laboratories For Frontier Technology Kirin Holdings Company Limited:(present Office)research
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Hayashi Kiyoshi
Renesas Technology Corporation Wafer Process Engineering Development Department
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Yamashita Tomohiro
Renesas Technology Corporation Wafer Process Engineering Development Department
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Hayashi Takashi
Renesas Technology Corporation Wafer Process Engineering Development Department
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Oda Hidekazu
Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Ishigaki Takashi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Tsuchiya Ryuta
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Tsuchiya Ryuta
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Yamashita Tomohiro
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Sugii Nobuyuki
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Sugii Nobuyuki
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Yoshimoto Hiroyuki
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Kimura Shinichiro
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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HIRAMOTO Toshiro
Institute Industrial Science, The University of Tokyo
著作論文
- Suppression of Boron Penetration from Source/Drain-Extension to Improve Gate Leakage Characteristics and Gate-Oxide Reliability for 65-nm Node CMOS and Beyond
- Evaluation of Threshold-Voltage Variation in Silicon on Thin Buried Oxide Complementary Metal–Oxide–Semiconductor and Its Impact on Decreasing Standby Leakage Current
- Investigation and Integration of Polycrystalline Silicon/TiN/SiON Gate Stack in Silicon on Thin Buried Oxide Complementary Metal Oxide Semiconductor Field Effect Transistors