Ohmi Tadahiro | Faculty Of Engineering Tohoku Univ.
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概要
関連著者
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Ohmi Tadahiro
Faculty Of Engineering Tohoku University
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Ohmi Tadahiro
Faculty Of Engineering Tohoku Univ.
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OHMI Tadahiro
Faculty of Engineering, Tohoku University
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Shibata Tadashi
Faculty Of Engineering Science Osaka University
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Shibata Tadashi
Department Of Information And Communication Engineering The University Of Tokyo
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Shibata T
Univ. Tokyo Tokyo Jpn
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Shibata T
Department Of Information And Communication Engineering The University Of Tokyo
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Shibata Tadashi
Faculty of Engineering, Tohoku University
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Shibata T
Ntt Photonics Laboratories Ntt Corporation:(present Address)ntt Science And Core Technology Group Nt
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Kotani K
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Kotani Koji
Graduate School Of Engineering Tohoku University
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Kotani Koji
Faculty of Environment and Information Sciences, Yokohama National University
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Kotani Koji
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
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Kotani K
Tohoku Univ. Sendai‐shi Jpn
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NITTA Takahisa
Device Development Center, Hitachi, Ltd.
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Morita Mizuho
Faculty Of Engineering Tohoku University
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Ohmi T
Tohoku Univ. Sendai Jpn
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INABA Hitoshi
Takasago Thermal Engineering Co., Ltd.
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YOSHIDA Takanori
Takasago Thermal Engineering Co., Ltd.
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OKADA Takao
Takasago Thermal Engineering Co., Ltd.
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MITSUI Yasuhiro
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
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Hoshi Tsukasa
Faculty of Engineering, Tohoku University
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Takewaki Toshiyuki
Faculty of Engineering, Tohoku University
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Hoshi Tsukasa
Faculty Of Engineering Tohoku University
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Kasama Yasuhiko
Faculty Of Engineering Tohoku University
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Takewaki Toshiyuki
Nec Electronics Corporation
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Takewaki Toshiyuki
Faculty Of Engineering Tohoku University
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Saito Kazuyuki
Ntt Lsi Laboratories
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Ohmi Tadahiro
Faculty Of Engineering Tokyo Institute Of Technology:(present Address)research Institute Of Electric
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Yabumoto Norikuni
Ntt Lsi Laboratories
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Hasuo Shinya
Faculty Of Engineering Tokyo Institute Of Technology:(present Address)fujitsu Laboratories Ltd.
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Nitta Takahisa
Device Development Center Hitachi Ltd.
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Ohki Atsushi
Technical Headquarters Osaka Sanso Kogyo Ltd.
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HAYASHI Shigeki
Technical Headquarters, Osaka Sanso Kogyo Ltd.
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Shimonishi Satoshi
Faculty of Engineering, Tohoku University
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Migita Tomohiro
Faculty of Engineering, Tohoku University
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Komori Hideki
Faculty of Engineering, Tohoku University
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Komori Hideki
Faculty Of Engineering Tohoku University
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Migita Tomohiro
Faculty Of Engineering Tohoku University
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Shimonishi Satoshi
Faculty Of Engineering Tohoku University
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Fukui Hirobumi
Department Of Information And Communication Engineering The University Of Tokyo
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Inaba Hitoshi
Takasago Thermal Engineering Co. Ltd.
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Mitsui Yasuhiro
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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Yamashita Takeo
Faculty Of Engineering Tohoku University:research Institute Of Electrical Communication Tohoku Unive
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Miki Nobuhiro
Hashimoto Chemical Corp.
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MAENO Matagoro
Hashimoto Chemical Corp.
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FUKUDOME Toshiro
Hashimoto Chemical Corp.
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FUKUDA Koichi
R amp D Div., FRONTEC Inc.
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FUKUI Hirobumi
R amp D Div., FRONTEC Inc.
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IWASAKI Chisato
R amp D Div., FRONTEC Inc.
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0N0 Shoichi
Alps Electric Co., Ltd.
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Yoshida Takanori
Takasago Thermal Engineering Co. Ltd.
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Okada Takao
Takasago Thermal Engineering Co. Ltd.
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Fukuda Koichi
R Amp D Div. Frontec Inc.
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Shibata Tadashi
Faculty Of Engineering Tohoku University
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Hayashi Shigeki
Technical Headquarters Osaka Sanso Kogyo Ltd.
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Shirai Yasuyuki
Faculty Of Engineering Tohoku University
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NARAZAKI Masaki
Faculty of Engineering, Tohoku University
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0n0 Shoichi
Alps Electric Co. Ltd.
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Iwasaki Chisato
R Amp D Div. Frontec Inc.
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Narazaki Masaki
Faculty Of Engineering Tohoku University
著作論文
- Neutralization of Static Electricity by Soft X-Ray and Vacuum Ultraviolet (UV)-Ray Irradiation (Special Issue on Scientific ULSI Manufacturing Technology)
- Characterizing Film Quality and Electromigration Resistance of Giant-Grain Copper Interconnects (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Oxidation Process of Hydrogen Terminated Silicon Surface Studied by Thermal Desorption Spectroscopy
- Quick External Leakage Inspection Method for Gas Supplying System in Semiconductor Facility Using Atmospheric Pressure Ionization Mass Spectrometer
- Impact of High-Precision Processing on the Functional Enhancement of Neuron-MOS Integrated Circuits (Special Issue on Scientific ULSI Manufacturing Technology)
- Self-Aligned Aluminum-Gate MOSFET's Having Ultra-Shallow Junctions Formed by 450℃ Furnace Annealing (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Spatial Distribution of the Light Intensity in the Injection Lasers
- Advanced Fluorite Regeneration Technology to Recover Spent Fluoride Chemicals Drained from Semiconductor Manufacturing Process (Special Issue on Scientific ULSI Manufacturing Technology)
- Improvement of PECVD-SiN_x for TFT Gate Insulator by Controlling Ion Bombardment Energy (Special Issue on Scientific ULSI Manufacturing Technology)
- Cr_2O_3 Passivated Gas Tubing System for Specialty Gases (Special Issue on Scientific ULSI Manufacturing Technology)
- The Concept of Four-Terminal Devices and Its Significance in the Implementation of Intelligent Integrated Circuits (Special Issue on Super Chip for Intelligent Integrated Systems)
- Neuron MOS Voltage-Mode Circuit Technology for Multiple-Valued Logic (Special Issue on Multiple-Valued Integrated Circuits)
- Minimizing the Edge Effect in a DRAM Cell Capacitor by Using a Structure with High-Permittivity Thin Film (Special Issue on Sub-Half Micron Si Device and Process Technologies)