Shibata Tadashi | Faculty of Engineering, Tohoku University

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概要

• 同名の論文著者
• Faculty of Engineering, Tohoku Universityの論文著者

関連著者

• Shibata Tadashi

  Department Of Information And Communication Engineering The University Of Tokyo

• Shibata T

  Univ. Tokyo Tokyo Jpn

• Shibata T

  Department Of Information And Communication Engineering The University Of Tokyo

• OHMI Tadahiro

  Faculty of Engineering, Tohoku University

• Shibata Tadashi

  Faculty of Engineering, Tohoku University

• Ohmi Tadahiro

  Faculty Of Engineering Tohoku University

• Shibata T

  Ntt Photonics Laboratories Ntt Corporation:(present Address)ntt Science And Core Technology Group Nt

• Shibata Tadashi

  Faculty Of Engineering Science Osaka University

• Ohmi Tadahiro

  Faculty Of Engineering Tohoku Univ.

• Kotani K

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Kotani Koji

  Graduate School Of Engineering Tohoku University

• Kotani Koji

  Faculty of Environment and Information Sciences, Yokohama National University

• Kotani Koji

  Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku

• Kotani K

  Tohoku Univ. Sendai‐shi Jpn

• NITTA Takahisa

  Device Development Center, Hitachi, Ltd.

• Hoshi Tsukasa

  Faculty of Engineering, Tohoku University

• Takewaki Toshiyuki

  Faculty of Engineering, Tohoku University

• Hoshi Tsukasa

  Faculty Of Engineering Tohoku University

• Takewaki Toshiyuki

  Nec Electronics Corporation

• Takewaki Toshiyuki

  Faculty Of Engineering Tohoku University

• Nitta Takahisa

  Device Development Center Hitachi Ltd.

• Shimonishi Satoshi

  Faculty of Engineering, Tohoku University

• Migita Tomohiro

  Faculty of Engineering, Tohoku University

• Komori Hideki

  Faculty of Engineering, Tohoku University

• Komori Hideki

  Faculty Of Engineering Tohoku University

• Migita Tomohiro

  Faculty Of Engineering Tohoku University

• Shimonishi Satoshi

  Faculty Of Engineering Tohoku University

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著作論文

• Characterizing Film Quality and Electromigration Resistance of Giant-Grain Copper Interconnects (Special Issue on Sub-Half Micron Si Device and Process Technologies)
• Impact of High-Precision Processing on the Functional Enhancement of Neuron-MOS Integrated Circuits (Special Issue on Scientific ULSI Manufacturing Technology)
• Self-Aligned Aluminum-Gate MOSFET's Having Ultra-Shallow Junctions Formed by 450℃ Furnace Annealing (Special Issue on Sub-Half Micron Si Device and Process Technologies)

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