Kitamoto Yoshitaka | Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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- 同名の論文著者
- Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And Eの論文著者
関連著者
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Kitamoto Yoshitaka
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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北本 仁孝
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering,
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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北本 仁孝
東京工業大学
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Kitamoto Yoshitaka
R&d Center Digital Equipment Corporation Japan
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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北本 仁孝
東京工大 大学院総合理工学研究科
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北本 仁孝
東京工業大学・大学院総合理工学研究科・物質科学創造専攻
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山崎 陽太郎
東京工業大学大学院総合理工学研究科物質科学創造専攻
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北本 仁孝
東京工業大学大学院 総合理工学研究科
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山崎 陽太郎
東京工業大学大学院 総合理工学研究科
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Hamaya Kohei
Department Of Electronics Kyushu University
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山崎 陽太郎
東京工業大学 大学院総合理工学研究科物質科学創造専攻
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山崎 陽太郎
東京工業大学
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北本 仁孝
東工大
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山崎 陽太郎
東京工業大学・大学院総合理工学研究科・物質科学創造専攻
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KITAMOTO Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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DJAYAPRAWIRA David
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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Munekata Hiro
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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Choi Young-suk
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Kato Hiroaki
Department Of Agricultural Chemistry Yamagata University
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Taniyama Tomoyasu
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Takeuchi Takashi
Department Of Chemical Engineering Science Yokohama National University
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Nagamine Yoshinori
Process Development Center Canon Anelva Corporation
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谷山 智康
東工大応セラ研
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山崎 陽太郎
東工大
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並木 禎尚
東京慈恵会医科大学臨床医学研究所
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西尾 博明
明治大学理工学部
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北本 仁孝
東工大総理工
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山元 洋
明治大学理工学部
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西尾 博明
明治大学工学部
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山元 洋
明治大学工学部
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近田 司
高温高圧流体技術研究所
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南 瑠美子
東京工業大学大学院総合理工学研究科
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加藤 俊作
高温高圧流体技術研究所
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渕上 輝顕
東京工業大学大学院総合理工学研究科物質科学創造専攻
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北本 仁孝
東京工業大学大学院総合理工学研究科
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加藤 俊作
高温高圧流体技術研
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Kitamoto Yoshitaka
Tokyo Inst. Of Technol. Yokohama Jpn
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Taniyama Tomoyasu
Materials And Structures Laboratory Tokyo Institute Of Technology
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Tsunekawa Koji
Process Development Center Canon Anelva Corporation
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Yamazaki Yohtaro
Department Of Electronic Chemistry Interdisciplinary Graduate School Of Science And Engineering Toky
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並木 禎尚
東京慈恵会医科大学
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Taniyama Tomoyasu
Materials and Structure Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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渕上 輝顕
東京工業大学
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TANIYAMA Tomoyasu
Materials and Structure Laboratory, Tokyo Institute of Technology
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石井 清
宇都宮大学工学科機能創成部
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YAMAZAKI Yohtaro
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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佐久間 洋志
宇都宮大学
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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何 浄沙
東京工業大学・大学院総合理工学研究科・物質科学創造専攻
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何 浄沙
埼玉大学大学院理工学研究科
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TAKEUCHI Takashi
Department of Pediatrics, Wakayama Medical University
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佐久間 洋志
東京工業大学総合理工学研究科
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Djayaprawira David
Canon Anelva Corp. Kanagawa Jpn
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舟窪 浩
東京工業大学大学院 総合理工学研究科 物質科学創造専攻
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石井 清
宇都宮大
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HAMAYA Kohei
Department of Electronics, Kyushu University
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小田原 修
東京工業大学
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北本 仁孝
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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北本 仁孝
東工大 電子物理工
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佐久間 洋志
宇都宮大学大学院電気電子システム工学専攻
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Tsunekawa Koji
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Hamaya Kohei
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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中川 勝
国立大学法人東北大学多元物質科学研究所
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KATO Hiroaki
Department of Urology
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TANIYAMA Tomoyasu
Materials and Structures Laboratory, Tokyo Institute of Technology
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MUNEKATA Hiro
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
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TANIYAMA Tomoyasu
Department of Innovative and Engineering Materials, Tokyo Institute of Technology
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谷山 智康
東工大 総理工
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中川 勝
東北大学多元物質科学研究所
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Taniyama T
東工大応セラ研
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河村 亮
東京工業大学大学院総合理工学研究科物質科学創造専攻
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KIM Tae-
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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HONG Yeong
Department of Chemistry, Kosin University
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木村 健一郎
東京工業大学・大学院総合理工学研究科・物質科学創造専攻
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清田 吾朗
東工大
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舟窪 浩
東工大院総合理工学研究科
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Hong Yeong
Department Of Chemistry Kosin University
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TSUNEKAWA Koji
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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CHOI Young-Suk
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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NAGAMINE Yoshinori
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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北本 仁孝
東京工業大学大学院総合理工学研究科物質科学創造専攻
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Oiwa Akira
Presto Japan Science And Technology Agency
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Moriya Rai
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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Genseki Akira
Center For Advanced Materials Analysis Tokyo Institute Of Technology
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Munekata Hiroo
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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KIM Tae-Youb
Department of Advanced Materials, Kosin University
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HOSHI Yoichi
Department of Electronic Engineering, Tokyo Institute of Polytechnics
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Munekata Hiro
Tokyo Inst. Of Technol. Yokohama Jpn
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北本 仁孝
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Tsunekawa Koji
Canon Anelva Corp. Kanagawa Jpn
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Yamazaki Yohtaro
Department Of Electronic Chemistry The Graduate School At Nagatsuta Tokyo Institute Of Technollogy
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Yamazaki Yohtaro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Kim Tae-
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagamine Yoshinori
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Kitamoto Yoshitaka
Tokyo Institute Of Technology
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原 正彦
東京工業大学/理化学研究所
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Kaneko Masahiko
Sony Corporation:tokyo Institute Of Technology
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Sueki Kengo
Tokyo Institute of Technology
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Takeuchi Takashi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Kato Hiroaki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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和田 裕之
東京工業大学大学院 総合理工学研究科
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小田原 修
東京工業大学大学院 総合理工学研究科
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加賀谷 俊介
東京工業大学大学院 総合理工学研究科
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江原 祥隆
東京工業大学大学院 総合理工学研究科
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原 正彦
東京工業大学大学院 総合理工学研究科
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Moriya Rai
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Masai Taku
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
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Yamazaki Yohtaro
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Tsunekawa Koji
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Munekata Hiro
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Hamaya Kohei
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Choi Young-suk
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183-8508, Japan
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Nagamine Yoshinori
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183-8508, Japan
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中川 勝
東北大学
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Genseki Akira
Center for Advanced Materials Analysis, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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Djayaprawira David
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183-8508, Japan
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Hoshi Yoichi
Department of System Electronics and Information Technology, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Taniyama Tomoyasu
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Munekata Hiroo
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Kato Hiroaki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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谷山 智康
東工大
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Taniyama Tomoyasu
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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上田 智章
Solutions Research Laboratory, Tokyo Institute of Technology
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阿部 正紀
Solutions Research Laboratory, Tokyo Institute of Technology
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正木 貴章
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering,
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Namiki Yoshihisa
Institute of Clinical Medicine and Research (ICMR), Jikei University School of Medicine
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Tsunekawa Koji
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183-8508, Japan
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Fuchigami Teruaki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8502, Japan
著作論文
- バイオ医療応用のための水溶性高分子で保護したFe-Ptナノ粒子の合成
- X線回折およびメスバウアー分光によるFe-Ptナノ粒子の原子配列評価
- 化学合成による部分的規則化Fe-Pt微粒子の構造と磁性
- 化学合成による部分的規則化Fe-Pt微粒子の構造と磁性(高密度磁気ストレージ材料 : 開発の現状・未来と解析技術)
- Ion Irradiation Control of Ferromagnetism in (Ga, Mn)As
- Magnetic Properties of L1_0 Fe-Ni-Pt Films for Heat Assisted Magnetic Recording(Selected papers from MORIS 2006 Workshop on Thermal & Optical Magnetic Materials and Devices)
- FePt/SiO_2複合型磁性ナノ粒子の作製
- Magnetic Anisotropy of Co-substituted Bi-DyAlIG Nanoparticles (特集 磁性材料)
- FePt/酸化鉄コアシェル・ナノ粒子の作製
- Fe-Coスパッタ薄膜へのカーボン添加効果
- Influence of Chemical Composition of CoFeB on Tunneling Magnetoresistance and Microstructure in Polycrystalline CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- 液中レーザーアブレーションによるInPナノ粒子の作製
- Crystallization of Amorphous CoFeB Ferromagnetic Layers in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- ナノシェル磁気カプセルを用いた磁気誘導ドラッグデリバリシステム
- Contribution of Shape Anisotropy to the Magnetic Configuration of (Ga, Mn)As
- Significant Change in In-Plane Magnetic Anisotropy of (Ga,Mn)As Epilayer Induced by Low-Temperature Annealing
- Improvement in Resonant Frequency of Magnetic Domain Wall Displacement in Soft Magnetic Thin Films by Slit Patterning
- センチネルリンパ節生検用磁気センサの開発
- 磁気カプセルを用いた磁気誘導ドラッグデリバリーシステム
- Ion Irradiation Control of Ferromagnetism in (Ga,Mn)As
- Growth of Fe-Pt Magnetic Nanoparticles on Silica Particles Modified with Organic Molecules (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
- Influence of Chemical Composition of CoFeB on Tunneling Magnetoresistance and Microstructure in Polycrystalline CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- 磁気カプセルを用いた磁気誘導ドラッグデリバリーシステム