Tsunekawa Koji | Canon Anelva Corp. Kanagawa Jpn
スポンサーリンク
概要
関連著者
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Djayaprawira David
Canon Anelva Corp. Kanagawa Jpn
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Tsunekawa Koji
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Tsunekawa Koji
Canon Anelva Corp. Kanagawa Jpn
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北本 仁孝
東京工業大学
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SUZUKI Yoshishige
Graduate School of Engineering Science, Osaka University
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TAKEUCHI Takashi
Department of Pediatrics, Wakayama Medical University
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ISHIBASHI Shota
Graduate School of Engineering Science, Osaka University
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SEKI Takeshi
Graduate School of Engineering Science, Osaka University
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NOZAKI Takayuki
Graduate School of Engineering Science, Osaka University
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KUBOTA Hitoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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YAKATA Satoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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FUKUSHIMA Akio
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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YUASA Shinji
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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MAEHARA Hiroki
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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TSUNEKAWA Koji
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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DJAYAPRAWIRA David
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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Djayaprawira David
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yuasa Shinji
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Yuasa Shinji
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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Seki Takeshi
Graduate School Of Engineering Science Osaka University
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology
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Kubota Hitoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Yakata Satoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Maehara Hiroki
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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KITAMOTO Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Nozaki Takayuki
Graduate School Of Engineering Science Osaka University
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Ishibashi Shota
Graduate School Of Engineering Science Osaka University
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TSUNEKAWA Koji
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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CHOI Young-Suk
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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NAGAMINE Yoshinori
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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DJAYAPRAWIRA David
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University:nanoelectronics Research Institute (neri) Na
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Kubota Hitoshi
National Inst. Advanced Industrial Sci. And Technol. (aist) Tsukuba Jpn
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Katayama Toshikazu
Tohoku Univ. Sendai Jpn
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Suzuki Yoshishige
Osaka Univ. Osaka Jpn
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Choi Young-suk
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Nagamine Yoshinori
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Kitamoto Yoshitaka
R&d Center Digital Equipment Corporation Japan
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Kitamoto Yoshitaka
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tsunekawa Koji
Process Development Center Canon Anelva Corporation
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Takeuchi Takashi
Department Of Chemical Engineering Science Yokohama National University
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Takeuchi Takashi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagamine Yoshinori
Process Development Center Canon Anelva Corporation
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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北本 仁孝
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering,
著作論文
- Large Diode Sensitivity of CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- Influence of Chemical Composition of CoFeB on Tunneling Magnetoresistance and Microstructure in Polycrystalline CoFeB/MgO/CoFeB Magnetic Tunnel Junctions