Suzuki Yoshishige | Graduate School Of Engineering Science Osaka University:nanoelectronics Research Institute (neri) Na
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概要
- SUZUKI Yoshishigeの詳細を見る
- 同名の論文著者
- Graduate School Of Engineering Science Osaka University:nanoelectronics Research Institute (neri) Naの論文著者
関連著者
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University:nanoelectronics Research Institute (neri) Na
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SUZUKI Yoshishige
Graduate School of Engineering Science, Osaka University
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University
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Suzuki Yoshishige
Osaka Univ. Osaka Jpn
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SHIRAISHI Masashi
Graduate School of Engineering Science, Osaka University
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Shiraishi Masashi
Graduate School Of Engineering Science Osaka Univ.
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NOZAKI Takayuki
Graduate School of Engineering Science, Osaka University
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Shinjo Teruya
Graduate School Of Engineering Science Osaka University
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Nozaki Takayuki
Graduate School Of Engineering Science Osaka University
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Yuasa Shinji
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Kubota Hitoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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SEKI Takeshi
Graduate School of Engineering Science, Osaka University
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KUBOTA Hitoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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FUKUSHIMA Akio
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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YUASA Shinji
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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Yuasa Shinji
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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Seki Takeshi
Graduate School Of Engineering Science Osaka University
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology
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Kubota Hitoshi
National Inst. Advanced Industrial Sci. And Technol. (aist) Tsukuba Jpn
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KUBOTA Hitoshi
Nanoelectronics Research Institute, AIST
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TOMITA Hiroyuki
Graduate School of Human and Environmental Studies, Kyoto University
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Tomita Hiroyuki
Graduate School Of Engineering Science Osaka University
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Konishi Katuaki
Graduate School Of Engineering Science Osaka University
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Kubota Hitoshi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Mizuguchi Masaki
Graduate School Of Engineering Science Osaka University
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ISHIBASHI Shota
Graduate School of Engineering Science, Osaka University
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YAKATA Satoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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MAEHARA Hiroki
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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TSUNEKAWA Koji
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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DJAYAPRAWIRA David
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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Djayaprawira David
Canon Anelva Corp. Kanagawa Jpn
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Djayaprawira David
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tsunekawa Koji
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yakata Satoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Maehara Hiroki
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yakushiji Kay
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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KONISHI Katuaki
Graduate School of Engineering Science, Osaka University
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YAKUSHIJI Kay
National Institute of Advanced Industrial Science and Technology (AIST)
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NAKATANI Yoshinobu
University of Electro-Communications
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FUKUSHIMA Akio
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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SHIOTA Yoichi
Graduate School of Engineering Science, Osaka University
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MARUYAMA Takuto
Graduate School of Engineering Science, Osaka University
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MIWA Shinji
Graduate School of Engineering Science, Osaka University
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Ishibashi Shota
Graduate School Of Engineering Science Osaka University
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Miwa Shinji
Graduate School Of Engineering Science Osaka University
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Shiota Yoichi
Graduate School Of Engineering Science Osaka University
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Tulapurkar Ashwin
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Uehara Yuji
Fujitsu Ltd.
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YOSHIOKA Takashi
Graduate School of Engineering Science, Osaka University
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MURAMOTO Kazuya
Graduate School of Engineering Science, Osaka University
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MITOMA Nobuhiko
Graduate School of Engineering Science, Osaka University
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YAGAMI Kojiro
Semiconductor Technology Development Group, SSNC, Sony Corp.
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SUZUKI Yoshishige
Osaka University, Graduate School of Engineering Science
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YAMAMOTO Atsushi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Katayama Toshikazu
Tohoku Univ. Sendai Jpn
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Maruyama Takuto
Graduate School Of Engineering Science Osaka University
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Mitoma Nobuhiko
Graduate School Of Engineering Science Osaka University
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Muramoto Kazuya
Graduate School Of Engineering Science Osaka University
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Konishi Katsunori
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-853
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Yagami Kojiro
Semiconductor Technology Development Group Ssnc Sony Corp.
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Tsunekawa Koji
Canon Anelva Corp. Kanagawa Jpn
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Yamamoto Atsushi
National Institute Of Advanced Industrial Science And Technology (aist) Thermoelectric Energy Conver
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Yoshioka Takashi
Graduate School Of Engineering Science Osaka University
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Yuasa Shinji
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Fukushima Akio
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Large Diode Sensitivity of CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- Single-Shot Measurements of Spin-Transfer Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- Voltage-Assisted Magnetization Switching in Ultrathin Fe_Co_ Alloy Layers
- Spin-Dependent Transport in C_-Co Nano-Composites
- Microwave-Assisted Magnetization Reversal in a Perpendicularly Magnetized Film
- Analysis of Degradation in Graphene-Based Spin Valves
- Current-Field Driven "Spin Transistor"
- Coupled-Mode Excitations Induced in an Antiferromagnetically Coupled Multilayer by Spin-Transfer Torque
- Peltier Effect in Sub-micron-Size Metallic Junctions
- Spin-Torque Diode Effect and Its Application(Advances in Spintronics)