Suzuki Yoshishige | Graduate School Of Engineering Science Osaka University
スポンサーリンク
概要
関連著者
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University
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Shiraishi Masashi
Graduate School Of Engineering Science Osaka Univ.
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Shinjo Teruya
Graduate School Of Engineering Science Osaka University
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SUZUKI Yoshishige
Graduate School of Engineering Science, Osaka University
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Suzuki Yoshishige
Graduate School Of Engineering Science Osaka University:nanoelectronics Research Institute (neri) Na
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SHIRAISHI Masashi
Graduate School of Engineering Science, Osaka University
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Yuasa Shinji
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology
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Nozaki Takayuki
Graduate School Of Engineering Science Osaka University
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Kubota Hitoshi
National Inst. Advanced Industrial Sci. And Technol. (aist) Tsukuba Jpn
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Suzuki Yoshishige
Osaka Univ. Osaka Jpn
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NOZAKI Takayuki
Graduate School of Engineering Science, Osaka University
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Seki Takeshi
Graduate School Of Engineering Science Osaka University
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Miwa Shinji
Graduate School Of Engineering Science Osaka University
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Shiota Yoichi
Graduate School Of Engineering Science Osaka University
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SEKI Takeshi
Graduate School of Engineering Science, Osaka University
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KUBOTA Hitoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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FUKUSHIMA Akio
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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YUASA Shinji
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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Yuasa Shinji
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Kubota Hitoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Bonell Frederic
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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SUZUKI Toshio
AIT, Akita Research Institute of Advanced Technology
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Mizuguchi Masaki
Graduate School Of Engineering Science Osaka University
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TOMITA Hiroyuki
Graduate School of Human and Environmental Studies, Kyoto University
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Ohkubo Tadakatsu
National Institute For Materials Science
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Hono Kazuhiro
National Inst. For Materials Sci. (nims) Ibaraki Jpn
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Tomita Hiroyuki
Graduate School Of Engineering Science Osaka University
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Konishi Katuaki
Graduate School Of Engineering Science Osaka University
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Oikawa Tohru
Sq Research Center Tdk Corporation
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Sasaki Tomoyuki
Sq Research Center Tdk Corporation
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Maehara Hiroki
Process Development Center Canon Anelva Corporation
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Nishimura Kazumasa
Process Development Center Canon Anelva Corporation
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Tsunekawa Koji
Process Development Center Canon Anelva Corporation
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Nagamine Yoshinori
Process Development Center Canon Anelva Corporation
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Ando Koji
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Kobayashi Satoshi
Graduate School Of Engineering Tokyo Metropolitan University
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Suzuki Yoshishige
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Nozaki Takayuki
National Institute of Advanced Industrial Science and Technology, Spintronics Research Center, Tsukuba, Ibaraki 305-8568, Japan
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Yoshikuni Shota
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Mizuochi Norikazu
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Seki Takayuki
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center, Tsukuba, Ibaraki 305-8568, Japan
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Deac Alina
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center, Tsukuba, Ibaraki 305-8568, Japan
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SASAKI Tomoyuki
SQ Research Center, TDK Corporation
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OIKAWA Tohru
SQ Research Center, TDK Corporation
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TAGAMI Katsumichi
SQ Research Center, TDK Corporation
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ISHIBASHI Shota
Graduate School of Engineering Science, Osaka University
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YAKATA Satoshi
National Institute of Advanced Industrial Science and Technology (AIST), Spintronics Research Center
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MAEHARA Hiroki
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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TSUNEKAWA Koji
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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DJAYAPRAWIRA David
Canon ANELVA Corporation, Magnetic Thin Film Development Division Process Development Center General
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KUBOTA Hitoshi
Nanoelectronics Research Institute, AIST
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Djayaprawira David
Canon Anelva Corp. Kanagawa Jpn
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Djayaprawira David
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Tsunekawa Koji
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yakata Satoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Maehara Hiroki
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Yakushiji Kay
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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KONISHI Katuaki
Graduate School of Engineering Science, Osaka University
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YAKUSHIJI Kay
National Institute of Advanced Industrial Science and Technology (AIST)
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NAKATANI Yoshinobu
University of Electro-Communications
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SHIOTA Yoichi
Graduate School of Engineering Science, Osaka University
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MARUYAMA Takuto
Graduate School of Engineering Science, Osaka University
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MIWA Shinji
Graduate School of Engineering Science, Osaka University
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Ishibashi Shota
Graduate School Of Engineering Science Osaka University
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Murakami Shinichi
Graduate School Of Advanced Science And Technology Tokyo Denki University
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Uehara Yuji
Fujitsu Ltd.
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YOSHIOKA Takashi
Graduate School of Engineering Science, Osaka University
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MURAMOTO Kazuya
Graduate School of Engineering Science, Osaka University
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MITOMA Nobuhiko
Graduate School of Engineering Science, Osaka University
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Katayama Toshikazu
Tohoku Univ. Sendai Jpn
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Maruyama Takuto
Graduate School Of Engineering Science Osaka University
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Mitoma Nobuhiko
Graduate School Of Engineering Science Osaka University
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Muramoto Kazuya
Graduate School Of Engineering Science Osaka University
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Konishi Katsunori
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-853
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Shiraishi Masashi
Graduate School Of Engineering Science Osaka University
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Tagami Katsumichi
Sq Research Center Tdk Corporation
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Suzuki Toshio
Ait Akita Research Institute Of Advanced Technology
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Tsunekawa Koji
Canon Anelva Corp. Kanagawa Jpn
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Yoshioka Takashi
Graduate School Of Engineering Science Osaka University
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Kubota Hitoshi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Murakami Shinichi
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Chappert Claude
Institut d'Electronique Fondamentale, UMR 8622 CNRS, Université Paris Sud, Bâtiment 220, 91405 Orsay, France
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Nozaki Takayuki
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Yagami Kojiro
SSNC, Semiconductor Technology Development Group, Sony Corp., Atsugi, Kanagawa 243-0014, Japan
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Tulapurkar Ashwin
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Devolder Thibaut
Institut d'Electronique Fondamentale, UMR 8622 CNRS, Université Paris Sud, Bâtiment 220, 91405 Orsay, France
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Crozat Paul
Institut d'Electronique Fondamentale, UMR 8622 CNRS, Université Paris Sud, Bâtiment 220, 91405 Orsay, France
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Crozat Paul
Institut d'Electronique Fondamentale, UMR 8622 CNRS, Université Paris Sud, Bâtiment 220, 91405 Orsay, France
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Devolder Thibaut
Institut d'Electronique Fondamentale, UMR 8622 CNRS, Université Paris Sud, Bâtiment 220, 91405 Orsay, France
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Suzuki Yoshishige
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Suzuki Yoshishige
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Noguchi Kiyoshi
SQ Research Center, TDK Corporation, Saku, Nagano 385-8555, Japan
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Ohishi Megumi
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Nouchi Ryo
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Shiraishi Masashi
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Shiota Yoichi
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Yuasa Shinji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Toshio
AIT, Akita Research Institute of Advanced Technology, Akita 010-1623, Japan
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Oikawa Tohru
SQ Research Center, TDK Corporation, Saku, Nagano 385-8555, Japan
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Kubota Hitoshi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Yuasa Shinji
National Institute of Advanced Industrial Science and Technology, Spintronics Research Center, Tsukuba, Ibaraki 305-8568, Japan
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Shinjo Teruya
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Shinjo Teruya
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Mizuguchi Masaki
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Ohkubo Tadakatsu
National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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Shiraishi Masashi
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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MIZUOCHI Norikazu
Graduate School of Engineering Science, Osaka University
著作論文
- Electrical Spin Injection into Silicon Using MgO Tunnel Barrier
- Large Diode Sensitivity of CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- Single-Shot Measurements of Spin-Transfer Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
- Voltage-Assisted Magnetization Switching in Ultrathin Fe_Co_ Alloy Layers
- Spin-Dependent Transport in C_-Co Nano-Composites
- Microwave-Assisted Magnetization Reversal in a Perpendicularly Magnetized Film
- Analysis of Degradation in Graphene-Based Spin Valves
- Current-Field Driven "Spin Transistor"
- Coupled-Mode Excitations Induced in an Antiferromagnetically Coupled Multilayer by Spin-Transfer Torque
- Room-Temperature Electron Spin Transport in a Highly Doped Si Channel
- Quantitative Evaluation of Voltage-Induced Magnetic Anisotropy Change by Magnetoresistance Measurement
- Spin-Torque Diode Effect and Its Application(Advances in Spintronics)
- Ultrahigh Speed Spin-Transfer Magnetization Switching in Magnetic Multilayers
- Spin Injection into a Graphene Thin Film at Room Temperature
- Characterization of MgO Thin Films Grown on Carbon Materials by Molecular Beam Epitaxy
- Characterization of MgO Thin Films Grown on Carbon Materials by Molecular Beam Epitaxy
- Large Emission Power over 2 μW with High Q Factor Obtained from Nanocontact Magnetic-Tunnel-Junction-Based Spin Torque Oscillator
- Growth of a High-Quality Ultrathin Fe(001) Layer on MgO(001) by Insertion of an Ultrathin \gamma-Fe
- Large Emission Power over 2μW with High Q Factor Obtained from Nanocontact Magnetic-Tunnel-Junction-Based Spin Torque Oscillator
- Growth of a High-Quality Ultrathin Fe(001) Layer on MgO(001) by Insertion of an Ultrathin γ-Fe₂O₃ Layer
- Spin-Dependent Transport in C60–Co Nano-Composites