KITAMOTO Yoshitaka | Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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概要
- Kitamoto Yoshitakaの詳細を見る
- 同名の論文著者
- Department of Innovative and Engineered Materials, Tokyo Institute of Technologyの論文著者
関連著者
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KITAMOTO Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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HAMAYA Kohei
Department of Electronics, Kyushu University
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Hamaya Kohei
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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TANIYAMA Tomoyasu
Department of Innovative and Engineering Materials, Tokyo Institute of Technology
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Kitamoto Yoshitaka
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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YAMAZAKI Yohtaro
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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北本 仁孝
東京工業大学
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KATO Hiroaki
Department of Urology
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MUNEKATA Hiro
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
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Taniyama T
東工大応セラ研
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Kitamoto Yoshitaka
R&d Center Digital Equipment Corporation Japan
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Kitamoto Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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北本 仁孝
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering,
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谷山 智康
東工大応セラ研
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北本 仁孝
東工大
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TAKEUCHI Takashi
Department of Pediatrics, Wakayama Medical University
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Djayaprawira David
Canon Anelva Corp. Kanagawa Jpn
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北本 仁孝
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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北本 仁孝
東工大 電子物理工
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Tsunekawa Koji
Canon Anelva Corporation Magnetic Thin Film Development Division Process Development Center General
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Hamaya Kohei
Department Of Electronics Kyushu University
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TANIYAMA Tomoyasu
Materials and Structures Laboratory, Tokyo Institute of Technology
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MORIYA Rai
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
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OIWA Akira
PRESTO, Japan Science and Technology Agency
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MUNEKATA Hiroo
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
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KIM Tae-
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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HONG Yeong
Department of Chemistry, Kosin University
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Hong Yeong
Department Of Chemistry Kosin University
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TSUNEKAWA Koji
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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CHOI Young-Suk
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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NAGAMINE Yoshinori
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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DJAYAPRAWIRA David
Process Technology Department, Electron Device Equipment Division, Canon ANELVA Corporation
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Munekata Hiro
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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KIM Tae-Youb
Department of Advanced Materials, Kosin University
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Munekata Hiro
Tokyo Inst. Of Technol. Yokohama Jpn
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Tsunekawa Koji
Canon Anelva Corp. Kanagawa Jpn
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Choi Young-suk
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Yamazaki Yohtaro
Department Of Electronic Chemistry The Graduate School At Nagatsuta Tokyo Institute Of Technollogy
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Yamazaki Yohtaro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Kim Tae-
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagamine Yoshinori
Process Technology Department Electron Device Equipment Division Canon Anelva Corporation
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Kitamoto Yoshitaka
Tokyo Inst. Of Technol. Yokohama Jpn
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Kato Hiroaki
Department Of Agricultural Chemistry Yamagata University
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Taniyama Tomoyasu
Materials And Structures Laboratory Tokyo Institute Of Technology
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Taniyama Tomoyasu
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Tsunekawa Koji
Process Development Center Canon Anelva Corporation
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Yamazaki Yohtaro
Department Of Electronic Chemistry Interdisciplinary Graduate School Of Science And Engineering Toky
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Takeuchi Takashi
Department Of Chemical Engineering Science Yokohama National University
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Takeuchi Takashi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Kato Hiroaki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Nagamine Yoshinori
Process Development Center Canon Anelva Corporation
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Taniyama Tomoyasu
Materials and Structure Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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TANIYAMA Tomoyasu
Materials and Structure Laboratory, Tokyo Institute of Technology
著作論文
- Ion Irradiation Control of Ferromagnetism in (Ga, Mn)As
- Significant Change in In-Plane Magnetic Anisotropy of (Ga, Mn)As Epilayer Induced by Low-Temperature Annealing
- Contribution of Shape Anisotropy to the Magnetic Configuration of (Ga, Mn)As
- Magnetic Anisotropy of Co-substituted Bi-DyAlIG Nanoparticles (特集 磁性材料)
- Influence of Chemical Composition of CoFeB on Tunneling Magnetoresistance and Microstructure in Polycrystalline CoFeB/MgO/CoFeB Magnetic Tunnel Junctions