Sakakibara Y | National Institute Of Advanced Industrial Science And Technology (aist)
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概要
- SAKAKIBARA Yutakaの詳細を見る
- 同名の論文著者
- National Institute Of Advanced Industrial Science And Technology (aist)の論文著者
関連著者
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Sakakibara Y
National Institute Of Advanced Industrial Science And Technology (aist)
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小林 孝嘉
東京大学理学系研究科
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SAKAKIBARA Youichi
Electrotechnical Laboratory
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KOBAYASHI Toshio
NTT System Electronics Laboratories
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SAKAKIBARA Yutaka
NTT System Electronics Laboratories
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Takahashi Minoru
Ceramic Engineering Research Laboratory Nagoya Institute Of Technology
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Takahashi Yoshihiro
Department Of Applied Physics School Of Engineering Tohoku University
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IIJIMA Masayuki
Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.
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TAKAHASHI Yoshikazu
Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.
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Ogawa Shinji
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Bera Raghu
National Institute Of Advanced Industrial Science And Technology (aist)
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TOKUMOTO Madoka
National Institute of Advanced Industrial Science and Technology
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Takahashi Y
Tanaka Solid Junction Project Erato Japan Science And Research Corporation
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SAKAKIBARA Youichi
National Institute of Advanced Industrial Science and Technology (AIST)
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SAITO Kazuhiro
National institute of Advanced Industrial Science and Technology (AIST)
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DEGUCHI Kimiyoshi
NTT System Electronics Laboratories
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Miyake Masayasu
Ntt System Electronics Laboratories
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Takahashi Yukihiro
Central Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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TAKAHASHI Mitsutoshi
NTT System Electronics Laboratories
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Ohsaki Shintaro
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Takahashi Y
National Inst. Animal Health Ibaraki Jpn
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Deguchi K
Department Of Electronics And Information Systems Osaka University
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Saito K
Research Center For Photovoltaics National Institute Of Advanced Industrial Science And Technology (
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Nakayama S
Sii Nano Technology Inc.
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Saito K
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Tsukuba‐shi Jpn
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Iijima Masayuki
Tsukuba Institute For Super Materials Ulvac Japan Ltd.
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TSUKAGOSHI Kiyomi
Tsukuba Institute for Super Materials, ULVAC JAPAN Ltd.
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Tsukagoshi K
National Inst. Advanced Industrial Sci. And Technol. (aist) Tsukuba Jpn
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Takahashi Y
Department Of Molecular & Materials Sciences Kyushu University
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Takahashi Yoshikazu
Tsukuba Institute For Super Materials Ulvac Japan Ltd.
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Saito Kazuhiro
National Institute Of Advanced Industrial Science And Technology
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SAKAKIBARA Youichi
National Institute of Advanced Industrial Science and Technology
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Tabe Michiharu
Ntt Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation
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SAKAKIBARA Yutaka
NTT Electrical Communications Laboratories, Nippon Telegraph and Telephone Corporation
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TANI Toshiro
Electrotechnical Laboratory, Tsukuba
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Tani T
Electrotechnical Lab. Ibaraki
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Tani Toshiro
Electrochnical Laboratory
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Tabe Michiharu
Ntt Electrical Communication Laboratories
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TAKAHASHI Mitsutoshi
NTT Electrical Communication Laboratories
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Nakayama Satoshi
NTT LSI Laboratories
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Kobayashi Toshio
NTT LSI Laboratories
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OGAWA Shigeo
NTT System Electronics Laboratories, Nippon Telegraph and Telephone Corporation
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NAKAYAMA Satoshi
NTT System Electronics Laboratories, Nippon Telegraph and Telephone Corporation
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OGAWA Shigeo
NTT LSI Laboratories
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SAKAKIBARA Yutaka
NTT LSI Laboratories
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Sakakibara Yutaka
Ntt Electrical Communication Laboratories
著作論文
- Enhancement of Red Electroluminescence from Device with Tetraphenylchlorin Doped into Hole-Transporting Material by Improving Electron Transporting Property : Atoms, Molecules, and Chemical Physics
- Red-Emitting Organic Electroluminescent Devices With Tetraphenylchlorin Doped into a Hole-Teansporting Material : Optics and Qantum Electronics
- Deep-Submicron Single-Gate Complementary Metal Oxide Semiconductor (CMOS) Technology Using Channel Preamorphization
- Deep-Submicron Single-Gate CMOS Technology Using Channel Preamorphization
- Oxygen-Doped Si Epitaxial Film (OXSEF)
- Evaluation of Hot-Hole-Induced Interface Traps at the Tunnel-SiO_2 (3.5 nm)/Si Interface by the Conductance Technique
- Evaluation of Hot-Hole Induced Interface Traps at the Tunneling SiO_2(3.5nm)-Si Interface by the Conductance Technique
- Bidirectional Orientation and Size Distribution of Copper Phthalocyanine (CuPc) Microcrystals Doped in Polyurea Film
- Preparation of Phthalocyanine-Dispersed Polymer Thin Film by Solvent-Free Process with Vapor Deposition Polymerization
- Designing of Photochemical Hole Burning Materials : Burning Process in Hydrogen Bonding and Proton Transfer Molecular System