Nakayama Satoshi | NTT LSI Laboratories
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概要
関連著者
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Nakayama Satoshi
NTT LSI Laboratories
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小林 孝嘉
東京大学理学系研究科
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Ogawa Shinji
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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IKEDA Koichi
NTT LSI Laboratories
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MAEDA Masahiko
NTT LSI Laboratories
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Sakai Tetsushi
Ntt Lsi Laboratories
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池田 浩一
NTT LSI研究所
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Ohsaki Shintaro
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Kobayashi Toshio
NTT LSI Laboratories
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Sakakibara Y
National Institute Of Advanced Industrial Science And Technology (aist)
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Nakayama S
Sii Nano Technology Inc.
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OGAWA Shigeo
NTT LSI Laboratories
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SAKAKIBARA Yutaka
NTT LSI Laboratories
著作論文
- Characteristics of Silicon Dioxide Film Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethoxysilane and Ozone with Alcohol Addition
- Diffusion and Segregation of Nitrogen in Polycrystalline Silicon and at the Poly-Si/SiO_2 Interface
- Evaluation of Hot-Hole Induced Interface Traps at the Tunneling SiO_2(3.5nm)-Si Interface by the Conductance Technique