JIN Yoshito | NTT Microsystem Integration Laboratories
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概要
関連著者
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JIN Yoshito
NTT Microsystem Integration Laboratories
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Shimada Masaru
Ntt Microsystem Integration Laboratories
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SAKATA Tomomi
NTT Microsystem Integration Laboratories
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Ono Toshiro
Ntt Microsystem Integration Laboratories
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SATO Yasuhiro
NTT Microsystem Integration Laboratories
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Saito Kunio
Ntt Microsystem Integration Laboratories
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SAKAI Hideaki
NTT Microsystem Integration Laboratories
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SHIMAMURA Toshishige
NTT Microsystem Integration Laboratories
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ISHII Hiromu
NTT Microsystem Integration Laboratories
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Jin Y
Ntt Microsystem Integration Laboratories
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Sato Norio
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Kuwabara Kei
Ntt Microsystem Integration Laboratories Ntt Corporation
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Fukuda Yukio
Tokyo University Of Science
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Kodate Junichi
Ntt Microsystem Integration Laboratories
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Ugajin Mamoru
Ntt Microsystem Integration Laboratories
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Ugajin Mamoru
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Mutoh Shin'ichiro
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Ono Kazuyoshi
NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Takagahara Kazuhiko
NTT Microsystem Integration Laboratories, Atsugi, Kanagawa 243-0198, Japan
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Kato Koji
Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan
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Ono Toshiro
Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan
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Ono Toshiro
NTT Microsystem Integration Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan
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Toyota Hiroshi
Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan
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Ono Kazuyoshi
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Shimamura Toshishige
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Jin Yoshito
NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Jin Yoshito
NTT Microsystem Integration Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan
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Jin Yoshito
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Jin Yoshito
NTT Microsystem Integration Laboratories, Atsugi, Kanagawa 243-0198, Japan
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Shimada Masaru
NTT Microsystem Integration Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan
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Sakata Tomomi
NTT Microsystem Integration Laboratories, Atsugi, Kanagawa 243-0198, Japan
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Sakai Hideaki
NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
著作論文
- Reversible Resistive Switching in Bi_4Ti_3O_ Thin Films Deposited by Electron Cyclotron Resonance Sputtering
- Metal-Oxide-Semiconductor-Diode Characteristics with SiO_2 Films Formed by Oxidation and Sputtering Using Electron-Cyclotron-Resonance-Plasma Stream
- Selective Removal of Dry-Etching Residue Derived from Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication
- Low-Temperature Silicon Oxidation with Very Small Activation Energy and High-Quality Interface by Electron Cyclotron Resonance Plasma Stream Irradiation
- Synchronized Multiple-Array Vibrational Device for Microelectromechanical System Electrostatic Energy Harvester
- Characterization of Metal Insulator Metal Electrical Properties of Electron Cyclotron Resonance Plasma Deposited Ta2O5
- Reversible Resistive Switching in Bi4Ti3O12 Thin Films Deposited by Electron Cyclotron Resonance Sputtering