Ono Toshiro | Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

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概要

• Ono Toshiroの詳細を見る
• 同名の論文著者
• Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japanの論文著者

関連著者

• Fukuda Yukio

  Tokyo University Of Science

• Ono Toshiro

  Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

• Toyota Hiroshi

  Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

• Kato Koji

  Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

• Otani Yohei

  Tokyo University of Science, Suwa, 5000-1 Toyohira, Chino, Nagano 391-0292, Japan

• Ueno Tomo

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• JIN Yoshito

  NTT Microsystem Integration Laboratories

• Fukuda Yukio

  Tokyo University of Science, Suwa, 5000-1 Toyohira, Chino, Nagano 391-0292, Japan

• Nagasato Yoshitaka

  Tokyo University of Agriculture and Technology, 2-24-16 Nakamachi, Koganei, Tokyo 184-8588, Japan

• Okamoto Hiroshi

  Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Iwasaki Takuro

  Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Izumi Kohei

  Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Ishizaki Hiroki

  Tokyo University of Science, Suwa, Chino, Nagano 391-0292, Japan

もっと見る 閉じる

著作論文

• Electrical Properties of Germanium Oxynitride and Its Interface with Germanium Prepared by Electron-Cyclotron-Resonance Plasma Oxidation and Nitridation
• Thermal Improvement and Stability of SiN/GeNx/p- and n-Ge Structures Prepared by Electron-Cyclotron-Resonance Plasma Nitridation and Sputtering at Room Temperature
• Electrical Characterization Techniques of Dielectric Thin Films Using Metal–Insulator–Metal Structures
• Characterization of Metal Insulator Metal Electrical Properties of Electron Cyclotron Resonance Plasma Deposited Ta2O5

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