Electrical Characterization Techniques of Dielectric Thin Films Using Metal–Insulator–Metal Structures

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概要

• 論文の詳細を見る

• In this paper, we describe an electrical characterization technique of dielectric thin films using metal–insulator–metal (MIM) structures and an LCR meter. It is demonstrated theoretically and experimentally that the equivalent parallel conductance and equivalent parallel capacitance of MIM capacitors necessarily show artificial frequency dispersions due to the effects of series resistance, owing to electrode and probing contact resistances. A procedure to extract the true equivalent parallel conductance and capacitance from measured admittance data is presented.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2007-10-30

著者

• Fukuda Yukio

  Tokyo University Of Science

• Ono Toshiro

  Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

• Otani Yohei

  Tokyo University of Science, Suwa, 5000-1 Toyohira, Chino, Nagano 391-0292, Japan

• Toyota Hiroshi

  Hirosaki University, 3 Bunkyo-cho, Hirosaki, Aomori 036-8561, Japan

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