Kim Dae | Magnachip Semiconductor Inc.
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概要
関連著者
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Kim Dae
Magnachip Semiconductor Inc.
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Kim D
Korea Institute For Advanced Study
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Kim Dae-byung
Dept. Of Materials Engineering Korea University Of Technology And Education
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KIM Dae
Korea institute for Advanced Study
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Han In-Shik
Dept. of Electronics Engineering, Chungnam National University
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GOO Tae-Gyu
Dept. of Electronics Engineering, Chungnam National University
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LEE Heui-Seung
Magnachip Semiconductor Inc.
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Lee H‐j
Dept. Of Electronics Engineering Chungnam National University
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Lee Hi-deok
R&d Division Lg Semicon Co. Ltd.
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Lee H‐j
Magnachip Semiconductor Inc.
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Han In-shik
Dept. Of Electronics Engineering Chungnam National University
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BAEK Chang-Ki
Korea Institute for Advanced Study
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Lee H‐d
Chungnam National Univ. Taejon Kor
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Han In-shik
Department Of Electronics Engineering Chungnam National University
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Kim Dae
Korea Atomic Energy Research Institute
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Goo Tae-gyu
Dept. Of Electronics Engineering Chungnam National University
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Park S‐h
Magnachip Semiconductor Inc.
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Kim Yong
Magnachip Semiconductor Inc.
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Lee Hi-Deok
Dept. of Electronics Engineering, Chungnam National University
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JI Hee-Hwan
Magnachip Semiconductor Inc.
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YOU Ook-Sang
Dept. of Electronics Engineering, Chungnam National University
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CHOI Won-Ho
Dept. of Electronics Engineering, Chungnam National University
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NA Min-Ki
Dept. of Electronics Engineering, Chungnam National University
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LEE Ga-Won
Dept. of Electronics Engineering, Chungnam National University
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KIM Yong-Goo
Magnachip Semiconductor Inc.
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PARK Sung-Hyung
Magnachip Semiconductor Inc.
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KANG Young-Seok
Magnachip Semiconductor Inc.
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KIM Dae-Byung
Magnachip Semiconductor Inc.
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LEE Hi-Deok
Department of Electronics Engineering, Chungnam National University
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Park Sung-soo
Dept. Of Electronics Engineering Chungnam National University
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Lee Hi-deok
Department Of Electronics Engineering Chungnam National University
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Lee Hi-deok
Dept. Of Electronics Engineering Chungnam National Univ.
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Na Min-ki
Dept. Of Electronics Engineering Chungnam National University
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Lee Ga-won
Dept. Of Electronics Engineering Chungnam National University
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Choi Won-ho
Dept. Of Electronics Engineering Chungnam National University
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Kim Y‐c
Magnachip Semiconductor Inc.
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Yoo Ook-sang
Dept. Of Electronics Engineering Chungnam National University
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Park Seong-hyun
Magnachip Semiconductor Inc.
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Kim Y‐j
Magnachip Semiconductor Inc.
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Jeong Y‐h
Pohang Univ. Sci. And Technol. Kyungpook Kor
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Ji Hee
Dept. Of Electronics Engineering Chungnam National University
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KIM Bomsoo
Korea Institute for Advanced Study
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JEONG Yoon-Ha
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology
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Ji Hee
Magnachip Semiconductor Inc.
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Kim Yong-goo
Electrical And Computer Engineering Chungnam National University
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SON Younghwan
Department of Electronics Engineering, Chungnam National University
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HAN In-Shik
Department of Electronics Engineering, Chungnam National University
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GOO Tae-Gyu
Department of Electronics Engineering, Chungnam National University
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Jeong Yoon-ha
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Song Yunheub
Department Of Electronics Engineering Chungnam National University
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Kwon Wookhyun
Memory Division Semiconductor Business Samsung Electronics Company Ltd.
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KIM Bomsoo
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology
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Park Si-ho
Chebigen Inc. 350-b. Chungmugwan Sejong University
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Son Younghwan
Department Of Electronics Engineering Chungnam National University
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Jeong Yoon-ha
Department Of Electrical And Electronic Engineering Pohang University Of Science And Technology
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Jeong Yoon-Ha
Department of Creative IT Excellence Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyeongbuk 790-784, Republic of Korea
著作論文
- New Observation of NBTI Degradation and Recovery Effect of Plasma Nitrided Oxide in Nano Scale PMOSFET's
- Near Surface Oxide Trap Density Profiling in NO and Remote Plasma Nitrided Oxides in Nano-Scale MOSFETs, Using Multi-Temperature Charge Pumping Technique : N_ vs. Oxide Processing
- Simple Experimental Determination of the Spread of Trapped Hot Holes Injected in Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) Cells : Optimized Erase and Cell Shrinkage